High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …

Ion irradiation is a key tool for controlling the nanostructure, phase content, and physical
properties of refractory ceramic thin films grown at low temperatures by magnetron …

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

Using movable emissive and floating probes, we determined the plasma and floating
potentials of an ionization zone (spoke) in a direct current magnetron sputtering discharge …

Up until recently, thin film growth by magnetron sputtering relied on enhancing adatom
mobility in the surface region by gas-ion irradiation to obtain dense layers at low deposition …

High-power impulse magnetron sputtering is a deposition technique where a metal
magnetron target is sputtered in a high-density plasma to synthesise thin layers with …

The angular dependence of the deposition rates due to ions and neutrals in high-power
impulse magnetron sputtering (HiPIMS) discharges with a titanium target were determined …

We demonstrate a self-consistent and complete description of electron dynamics in a typical
electropositive radio frequency magnetron sputtering (RFMS) argon discharge with a …

The energy of the sputtered atoms is important to control the microstructure and physical
properties of thin films. In this work, we used the SRIM program to simulate the energy of …

There is currently a transformed interest toward understanding the impact of fermentation on
functional food development due to growing consumer interest on modified health benefits …