Ptychographic Coherent Diffractive Imaging enables diffraction-limited imaging of nanoscale
structures at extreme ultraviolet and x-ray wavelengths, where high-quality image-forming …

We present a general algorithm for combining measurements taken under various
illumination and imaging conditions to quantitatively extract the amplitude and phase of an …

While the industrial implementation of extreme ultraviolet lithography for upcoming
technology nodes is becoming ever more realistic, a number of challenges have yet to be …

Extreme ultraviolet (EUV) lithography is expected to be used for 3 nm technology nodes and
beyond, yet the need for actinic mask metrology and inspection remains a critical challenge …

摘要离轴照明技术是光刻工艺中提高成像分辨率的关键技术之一. 本文提出了一种基于傅里叶
合成技术的照明系统, 该系统能够实现任意照明模式, 并可以提高成像数值孔径 …

For the successful implementation of extreme ultraviolet (EUV) lithography in the upcoming
technology nodes, a major challenge to overcome is the stable and reliable detection and …

The SEMATECH High Numerical Aperture Actinic Reticle Review Project (SHARP) is a
synchrotron-based extreme ultraviolet (EUV) microscope dedicated to photomask research …

Fourier ptychography is a computational imaging techniques that combines various full-field
coherent images acquired under varied illumination angles and combined to yield a angular …

We demonstrate a method for characterizing the field-dependent aberrations of a full-field
synchrotron-based extreme ultraviolet microscope. The statistical uniformity of the inherent …

Extreme ultraviolet (EUV) microscopy is invaluable for the development of EUV photomasks,
providing detailed information for the creation of new mask processes, and reliable feedback …