Heteroepitaxial growth of III-V semiconductors on silicon

JS Park, M Tang, S Chen, H Liu - Crystals, 2020 - mdpi.com
Monolithic integration of III-V semiconductor devices on Silicon (Si) has long been of great
interest in photonic integrated circuits (PICs), as well as traditional integrated circuits (ICs) …

Review of highly mismatched III-V heteroepitaxy growth on (001) silicon

Y Du, B Xu, G Wang, Y Miao, B Li, Z Kong, Y Dong… - Nanomaterials, 2022 - mdpi.com
Si-based group III-V material enables a multitude of applications and functionalities of the
novel optoelectronic integration chips (OEICs) owing to their excellent optoelectronic …

High-Efficiency Solution-Processed Cu2ZnSn(S,Se)4 Thin-Film Solar Cells Prepared from Binary and Ternary Nanoparticles

Y Cao, MS Denny Jr, JV Caspar… - Journal of the …, 2012 - ACS Publications
A new solution-based method to fabricate Cu2ZnSn (S, Se) 4 (CZTSSe) thin films is
presented. Binary and ternary chalcogenide nanoparticles were synthesized and used as …

High-Q Optical Sensors for Chemical and Biological Analysis

MS Luchansky, RC Bailey - Analytical chemistry, 2012 - ACS Publications
Optical sensors represent a vitally important class of analytical tools that have been used to
provide chemical information ranging from analyte concentration and binding kinetics to …

Epitaxial growth of highly mismatched III-V materials on (001) silicon for electronics and optoelectronics

Q Li, KM Lau - Progress in Crystal Growth and Characterization of …, 2017 - Elsevier
Monolithic integration of III-V on silicon has been a scientifically appealing concept for
decades. Notable progress has recently been made in this research area, fueled by …

[HTML][HTML] Carbon nanotube-based black coatings

J Lehman, C Yung, N Tomlin, D Conklin… - Applied physics …, 2018 - pubs.aip.org
Coatings comprising carbon nanotubes are very black, that is, characterized by uniformly
low reflectance over a broad range of wavelengths from the visible to far infrared. Arguably …

Site selective integration of III–V materials on Si for nanoscale logic and photonic devices

M Paladugu, C Merckling, R Loo, O Richard… - Crystal Growth & …, 2012 - ACS Publications
Integrating high electron mobility III–V materials on an existing Si based CMOS processing
platform is considered as a main stepping stone to increase the CMOS performance and …

III–V/Ge channel MOS device technologies in nano CMOS era

S Takagi, R Zhang, J Suh, SH Kim… - Japanese Journal of …, 2015 - iopscience.iop.org
CMOS utilizing high-mobility III–V/Ge channels on Si substrates is expected to be one of the
promising devices for high-performance and low power advanced LSIs in the future …

Heteroepitaxy of InP on Si (001) by selective-area metal organic vapor-phase epitaxy in sub-50 nm width trenches: The role of the nucleation layer and the recess …

C Merckling, N Waldron, S Jiang, W Guo… - Journal of Applied …, 2014 - pubs.aip.org
This study relates to the heteroepitaxy of InP on patterned Si substrates using the defect
trapping technique. We carefully investigated the growth mechanism in shallow trench …

[图书][B] Metalorganic vapor phase epitaxy (MOVPE): Growth, materials properties, and applications

S Irvine, P Capper - 2019 - books.google.com
Systematically discusses the growth method, material properties, and applications for key
semiconductor materials MOVPE is a chemical vapor deposition technique that produces …