Selective etch using a sacrificial mask
A method for selectively etching a silicon oxide region with respect to a lower oxygen silicon
containing region is provided. A sacrificial mask selectively deposited on the lower oxygen …
containing region is provided. A sacrificial mask selectively deposited on the lower oxygen …
Apparatus and methods for selectively etching silicon oxide films
F Wang, WJ Shin - US Patent 11,437,241, 2022 - Google Patents
An apparatus and methods for selectively etching a particular layer are disclosed. The
apparatus and methods are directed towards maintaining the etch rate of the particular layer …
apparatus and methods are directed towards maintaining the etch rate of the particular layer …