High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …

A new reactive ionization region model (R-IRM) is developed to describe the reactive Ar/O 2
high power impulse magnetron sputtering (HiPIMS) discharge with a titanium target. It is …

Low surface roughness, low residual stress, and (002) textured aluminum nitride (AlN) thin
films are favored for applications in microelectronic and optoelectronic devices. In this paper …

A detailed experimental study of high power impulse magnetron sputtering processes is
performed by time-resolved imaging of the ground state sputtered particles. New details …

This paper discusses a few mechanisms that can assist to answer the title question. The
initial approach is to use an established model for DC magnetron sputter deposition, ie …

Gallium nitride (GaN) epitaxial films on sapphire (Al 2 O 3) substrates have been grown
using reactive magnetron sputter epitaxy with a liquid Ga target. Threading dislocations …

The use of high-power impulse magnetron sputtering (HIPIMS) to deposit chromium-based
thin films on brass substrates for the purpose of corrosion-protective coating was …

The structural properties of hafnium nitride films are mainly influenced by the deposition
conditions, which are affected by the sputtering technique. A suitable use of the different …

The present work studies thermal processes in DC magnetron sputtering units. A unit with a
single hot titanium target is used to deposit films of titanium and titanium nitride. Another …

High-power impulse magnetron sputtering (HiPIMS) plus kick is a physical vapor deposition
method that employs bipolar microsecond-scale voltage pulsing to precisely control the ion …