Sub-10-nm electron-beam lithography for templated placement of colloidal quantum dots

Interface interaction induced ultra-dense nanoparticles assemblies

Y Song, Y Wang, BB Li, C Fernandes, HE Ruda - Nanoscale, 2013 - pubs.rsc.org
We demonstrate a simple and clean physical methodology for fabricating such nanoparticle
assemblies (dense arrays and/or dendrites) related to the interfacial interaction between the …
被引用次数：22 相关文章 所有 4 个版本

[引用][C] 电子束光刻三维微结构的模拟仿真

鲍先同， 幸研 - 传感器世界, 2016
相关文章 所有 2 个版本

[引用][C] Resolution improvements on poly (methyl methacrylate) as electron-beam resist

JP Arrieta - 2012 - San José, Costa Rica
相关文章 所有 2 个版本