Simulations of thin film sputter deposition require the separation of the plasma and material
transport in the gas phase from the growth/sputtering processes at the bounding surfaces …

Simulations of Al thin film sputter depositions rely on accurate plasma and surface
interaction models. Establishing the latter commonly requires a higher level of abstraction …

A unified model of thin film deposition by means of sputter deposition requires a description
which bridges the intrinsic time and length scales of both the solid and the gas-phase. As a …

A knowledge-based understanding of the plasma-surface-interaction with the aim to
precisely control (reactive) sputtering processes for the deposition of thin films with tailored …

Abstract Particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations are performed to
investigate the sputtering and the secondary electron emission (SEE) in geometrically …

Understanding and modeling plasma–surface interactions frame a multi-scale as well as
multi-physics problem. Scale-bridging machine learning surface surrogate models have …

Sputtered Cu/Si thin films were experimentally prepared at different sputtering pressures
and characterized using X-ray diffraction (XRD) and an atomic force microscope (AFM) …

In this work, an integrated multiscale simulation of magnetron sputtering epitaxy was
conducted to study the effect of sputtering pressure on the surface micro-topography of …

We present a three-dimensional particle-based computer simulation of high-power impulse
magnetron sputtering (HiPIMS) discharges which enables us to simulate the transport of …

A Monte Carlo (MC) and molecular dynamics (MD) coupling simulation scheme for sputtered
particle transport was first proposed in this work. In this scheme, the MC method was utilized …