This chapter describes polymers employed in formulation of chemically amplified resists for
microlithography, which have become the workhorse in device manufacturing for the last few …

Page 1 ADVANCES IN POLYMER SCIENCE 172 Microlithography Molecular Imprinting
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Chemically amplified (CA) resists are in widespread use for the fabrication of leading-edge
microelectronic devices, and it is anticipated that they will see use well into the future. The …

Acid diffusion during postexposure baking is viewed to be a limiting factor in the extension of
lithography using chemically amplified resists to formation of nanoscale features …

In a chemically amplified resist absorbed photons generate stable catalyst molecules
instead of directly switching resist solubility via photochemical reaction. This allows for much …

Photoresist materials enable the fabrication of advanced integrated circuits with ever‐
decreasing feature sizes. As next‐generation light sources are developed, using extreme …

Multiphase chemical reactions (gas+ solid/liquid) involve a complex interplay between bulk
and interface chemistry, diffusion, evaporation, and condensation. Reactions of atmospheric …

The acrylate copolymers consisting of 4-hydroxybutyl acrylate (HBA), 2-(tert-butoxy-
carbonyloxy) ethyl acrylate (BHEA) or 4-(tert-butoxycarbonyloxy) butyl acrylate (BHBA), and …

A key uncertainty in the heterogeneous oxidation of carboxylic acids by hydroxyl radicals
(OH) in aqueous-phase aerosol is how the free-radical reaction pathways might be altered …

The heterogeneous oxidation of organic aerosol by hydroxyl radicals (OH) can proceed
through two general pathways: functionalization, in which oxygen functional groups are …