Co and terpolymer reactivity ratios of chemically amplified resists
NS Pujari, M Wang, KE Gonsalves - Polymer, 2017 - Elsevier
Resists are important multicomponent system require in microelectronic industry for
fabrication of integrated circuit (IC) devices. The current high end IC (integrated circuit) …
fabrication of integrated circuit (IC) devices. The current high end IC (integrated circuit) …
[PDF][PDF] A new statistical point of view to choose a better linear model for reactivity and microstructure analysis in HEMA/furfuryl acrylate copolymerization process
GF Estevez, OV Lizama, DZ Silva… - ADVANCED …, 2013 - researchgate.net
Copolymers of 2–hydroxyethyl methacrylate (E) and furfuryl acrylate (A) were prepared by
free radical polymerization in toluene at 80 C using benzoyl peroxide as initiator …
free radical polymerization in toluene at 80 C using benzoyl peroxide as initiator …