Evolution in lithography techniques: microlithography to nanolithography

E Sharma, R Rathi, J Misharwal, B Sinhmar, S Kumari… - Nanomaterials, 2022 - mdpi.com
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and
many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying …

[HTML][HTML] Nanofabrication through molding

Z Liu, N Liu, J Schroers - Progress in Materials Science, 2022 - Elsevier
Nanomolding usually refers to a top-down fabrication method by which a formable or
moldable material is shaped using a mold of nanoscale dimensions. Nanomolding is the …

[PDF][PDF] Wetting models and working mechanisms of typical surfaces existing in nature and their application on superhydrophobic surfaces: a review

E Jiaqiang, Y Jin, Y Deng, W Zuo, X Zhao… - Adv. Mater …, 2018 - researchgate.net
Wetting Models and Working Mechanisms of Typical Surfaces Existing in Nature and Their
Application on Superhydrophobic Surfaces: Page 1 www.advmatinterfaces.de REVIEW …

EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning

P Constantinou, TJZ Stock, LT Tseng, D Kazazis… - Nature …, 2024 - nature.com
Atomically precise hydrogen desorption lithography using scanning tunnelling microscopy
(STM) has enabled the development of single-atom, quantum-electronic devices on a …

Recent progress in simple and cost‐effective top‐down lithography for≈ 10 nm scale nanopatterns: from edge lithography to secondary sputtering lithography

WB Jung, S Jang, SY Cho, HJ Jeon… - Advanced …, 2020 - Wiley Online Library
The development of a simple and cost‐effective method for fabricating≈ 10 nm scale
nanopatterns over large areas is an important issue, owing to the performance …

Extreme ultraviolet lithography

D Kazazis, JG Santaclara, J van Schoot… - Nature Reviews …, 2024 - nature.com
Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry
as the leading-edge lithography technique for continued miniaturization of semiconductor …

Nanostructure and microstructure fabrication: from desired properties to suitable processes

P van Assenbergh, E Meinders, J Geraedts, D Dodou - Small, 2018 - Wiley Online Library
When designing a new nanostructure or microstructure, one can follow a processing‐based
manufacturing pathway, in which the structure properties are defined based on the …

Fluorine-rich zinc oxoclusters as extreme ultraviolet photoresists: chemical reactions and lithography performance

N Thakur, M Vockenhuber, Y Ekinci, B Watts… - ACS Materials …, 2022 - ACS Publications
The absorption of extreme ultraviolet (EUV) radiation by a photoresist strongly depends on
its atomic composition. Consequently, elements with a high EUV absorption cross section …

X-ray lithography for nanofabrication: is there a future?

A Bharti, A Turchet, B Marmiroli - Frontiers in Nanotechnology, 2022 - frontiersin.org
X-ray lithography has been first proposed almost 50 years ago, and the related LIGA
process around 25 years ago. It is therefore a good time to make an analysis of the …

[HTML][HTML] High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch

Z Shi, K Jefimovs, M Stampanoni, L Romano - Materials Science in …, 2023 - Elsevier
Structuring Si in arrays of vertical high aspect ratio pillars, ranging from nanoscale to
macroscale feature dimensions, is essential for producing functional interfaces for many …