Structural properties of self-organized semiconductor nanostructures

J Stangl, V Holý, G Bauer - Reviews of modern physics, 2004 - APS
Instabilities in semiconductor heterostructure growth can be exploited for the self-organized
formation of nanostructures, allowing for carrier confinement in all three spatial dimensions …

Ge dots and nanostructures grown epitaxially on Si

JM Baribeau, X Wu, NL Rowell… - Journal of Physics …, 2006 - iopscience.iop.org
We review recent progress in the growth and characterization of Si 1− x Ge x islands and Ge
dots on (001) Si. We discuss the evolution of the island morphology with Si 1− x Ge x …

Raman characterization of strain and composition in small-sized self-assembled Si/Ge dots

PH Tan, K Brunner, D Bougeard, G Abstreiter - Physical Review B, 2003 - APS
A detailed Raman characterization of the structural properties of as-grown and annealed self-
assembled Si/Ge dot multilayers is reported in this paper. Several new modes in as-grown …

Three-dimensional composition profiles of single quantum dots determined by scanning-probe-microscopy-based nanotomography

A Rastelli, M Stoffel, A Malachias, T Merdzhanova… - Nano …, 2008 - ACS Publications
Scanning probe microscopy combined with selective wet chemical etching is employed to
quantitatively determine the full three-dimensional (3D) composition profiles of single …

Key role of the wetting layer in revealing the hidden path of Ge/Si (001) Stranski-Krastanow growth onset

M Brehm, F Montalenti, M Grydlik, G Vastola… - Physical Review B …, 2009 - APS
The commonly accepted Stranski-Krastanow model, according to which island formation
occurs on top of a wetting layer (WL) of a certain thickness, predicts for the morphological …

Strain relaxation in high Ge content SiGe layers deposited on Si

G Capellini, M De Seta, Y Busby, M Pea… - Journal of Applied …, 2010 - pubs.aip.org
We have used Raman spectroscopy, transmission electron microscopy, x-ray diffraction, and
x-ray photoemission spectroscopy to investigate strain relaxation mechanism of Si 0.22 Ge …

Delayed Plastic Relaxation on Patterned Si Substrates: <?format ?>Coherent SiGe Pyramids with Dominant Facets

Z Zhong, W Schwinger, F Schäffler, G Bauer, G Vastola… - Physical review …, 2007 - APS
Unimodal SiGe islands with dominant {111} facets were grown coherently on pit-patterned
Si (001) substrates by molecular beam epitaxy. With increasing Ge deposition, the {111} …

Nanometer-scale composition measurements of Ge/Si (100) islands

M Floyd, Y Zhang, KP Driver, J Drucker… - Applied Physics …, 2003 - pubs.aip.org
Quantitative, nanometer-scale spatial resolution electron energy-loss spectroscopy EELS
was used to map the composition of coherent islands grown by molecular-beam epitaxy of …

Continuum modelling of semiconductor heteroepitaxy: an applied perspective

R Bergamaschini, M Salvalaglio, R Backofen… - … in Physics: X, 2016 - Taylor & Francis
Semiconductor heteroepitaxy involves a wealth of qualitatively different, competing
phenomena. Examples include three-dimensional island formation, injection of dislocations …

Ordering self-assembled islands without substrate patterning

G Capellini, M De Seta, C Spinella… - Applied physics …, 2003 - pubs.aip.org
The self-patterning of the strain field that arises in the growth of stacked multilayers of
heteroepitaxial islands, together with the capability of tuning the island size by acting on the …