Graphene nanoribbons (GNRs) have recently emerged as promising candidates for channel
materials in future nanoelectronic devices due to their exceptional electronic, thermal, and …

Graphene is an ideal material for optoelectronic applications. Its photonic properties give
several advantages and complementarities over Si photonics. For example, graphene …

Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

Abstract Highly efficient, ultrathin (~ 400 nm) pure sulfide kesterite Cu 2 ZnSnS 4 (CZTS)
solar cells have been realized by interface reaction route controlling and self-organized …

Graphene is a two dimensional material with extraordinary properties, which make it an
interesting material for many optical and electronic devices. The integration of graphene in …

A novel method to form ultrathin, uniform Al2O3 layers on graphene using reversible
hydrogen plasma functionalization followed by atomic layer deposition (ALD) is presented …

BiFeO3 (BFO) films on highly oriented pyrolytic graphite (HOPG) substrate were obtained by
the atomic layer deposition (ALD) method. The oxidation of HOPG leads to the formation of …

The advantages of three-dimensional (3D) printing technologies, such as rapid-prototyping
and the freedom to customize electrodes in any design, have elevated the benchmark of …

Modern information technologies have tremendous demands on flexible electronic devices
such as thin-film transistors (TFTs). As the flexible TFT technology continues to advance, the …

Coating electrode materials with metal oxide thin films can improve the performance of
electrocatalysts and charge storage materials. Atomic layer deposition (ALD) enables the …