Silicon MOS optoelectronic micro‐nano structure based on reverse‐biased PN junction

K Xu - physica status solidi (a), 2019 - Wiley Online Library
Photon emission from Si p‐channel MOS field‐effect transistor (PMOSFET) having 6‐μm
effective gate length that is operated as a three‐terminal gate‐controlled light‐emitting diode …

[图书][B] Smart CMOS image sensors and applications

J Ohta - 2020 - taylorfrancis.com
Revised and expanded for this new edition, Smart CMOS Image Sensors and Applications,
Second Edition is the only book available devoted to smart CMOS image sensors and …

Light emission from a poly-silicon device with carrier injection engineering

K Xu, L Huang, Z Zhang, J Zhao, Z Zhang… - Materials Science and …, 2018 - Elsevier
Abstract Development work was conducted on N+ PN+ PN+ Poly silicon light-emitting
devices which are compatible with silicon-based integrated circuit technology. We discuss …

Integrated silicon directly modulated light source using p-well in standard CMOS technology

K Xu - IEEE Sensors Journal, 2016 - ieeexplore.ieee.org
This paper studies integrated silicon light emitter implemented in standard CMOS
technologies. A new MOS-like structure utilizing deep p-well is presented, and compared …

Monolithically integrated Si gate-controlled light-emitting device: science and properties

K Xu - Journal of optics, 2018 - iopscience.iop.org
The motivation of this study is to develop ap–n junction based light emitting device, in which
the light emission is conventionally realized using reverse current driving, by voltage driving …

Gate-controlled diode structure based electro-optical interfaces in standard silicon-CMOS integrated circuitry

K Xu, H Liu, Z Zhang - Applied Optics, 2015 - opg.optica.org
In this paper, we discuss the emission of visible light by a monolithically integrated silicon
gate-controlled diode with the pn junction reverse-biased. Since the MOS-like diode utilizes …

Design and fabrication of a monolithic optoelectronic integrated Si CMOS LED based on hot-carrier effect

K Xu, S Liu, W Sun, Z Ma, Z Li, Q Yu… - IEEE Journal of Selected …, 2016 - ieeexplore.ieee.org
New research results with regard to two-and three-terminal Si-LEDs realized in a silicon
MOS-like device fabricated using the CMOS process technology are presented. Since in the …

Si-based current-density-enhanced light emission and low-operating-voltage light-emitting/receiving designs

HC Lee, CK Liu - Solid-state electronics, 2005 - Elsevier
By the standard Si-CMOS process, several designs are investigated of low-operating-
voltage light-emitting/receiving devices. Our forward-biasing Si-LED designs having power …

Light-emitting device with monolithic integration on bulk silicon in standard complementary metal oxide semiconductor technology

K Xu, G Li - Journal of Nanophotonics, 2013 - spiedigitallibrary.org
A silicon light-emitting device is designed and realized in standard 3-μ m complementary
metal oxide semiconductor (CMOS) integrated circuitry. Accordingly, it can be integrated …

An pixel dot matrix microdisplay in 0.35-μm complementary metal-oxide semiconductor technology

PJ Venter, M Du Plessis, AW Bogalecki… - Optical …, 2012 - spiedigitallibrary.org
Microdisplay technologies for near-to-eye applications mostly use a complementary metal-
oxide semiconductor (CMOS) processing chip as backplane for pixel addressing, with …