Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer model

A Herrera-Gomez, DM Guzman-Bucio… - Journal of Vacuum …, 2023 - pubs.aip.org
The multilayer model (MLM) for assessing the structural and composition parameters of
multilayered nanofilms from angle-resolved x-ray photoelectric spectroscopy is described in …

Optimization on the electrical discharge machining (EDM) process parameters of aged AA7075/TiC metal matrix composites

P Rajendran, V Duraisamy… - Revista de …, 2023 - revistademetalurgia.revistas.csic.es
The need to optimize the process parameters in Electrical Discharge Machining (EDM) for
aged AA7075 Metal Matrix Composites (AAMMCs) is evident as it impacts various aspects …

Experimental determination of reference intensity ratio essential for accurate thickness measurement of HfO2 ultrathin films by XPS

L Zhang, Y Azuma, A Kurokawa… - Surface and Interface …, 2024 - Wiley Online Library
When measuring the thickness of ultrathin overlayer films using X‐ray photoelectron
spectroscopy (XPS), accurate values of the reference intensity ratio (R0) and the effective …

Review on the thickness measurement of ultrathin oxide films by mutual calibration method

KJ Kim - Surface and Interface Analysis, 2022 - Wiley Online Library
Mutual calibration was suggested as a method to determine the absolute thickness of
ultrathin oxide films. It was motivated from the large offset values in the reported thicknesses …

Uncertainty in the mutual calibration method for the traceable thickness measurement of ultra-thin oxide films

SM Lee, JC Woo, TG Kim, KJ Kim - Metrologia, 2021 - iopscience.iop.org
Mutual calibration by a combination of a zero-offset method and a length-unit traceable
method has been suggested as a promising approach to determine the traceable thickness …

The Surface Analysis Working Group at the Consultative Committee for Amount of Substance, Metrology in Chemistry and Biology: A successful initiative by Martin …

WES Unger, T Fujimoto - Surface and Interface Analysis, 2022 - Wiley Online Library
Dr Martin Seah, NPL, was the initiator, founder, and first chairman of the Surface Analysis
Working Group (SAWG) at the Consultative Committee for Amount of Substance, Metrology …

[图书][B] Characterization of photo-physical properties of semiconductor quantum dots at the ensemble and single particle level

FE Weigert - 2021 - search.proquest.com
Semiconductor nanocrystals (SC NCs), also known as quantum dots (QDs) offer unique
optical properties like tunable narrow emission spectra, large absorption cross sections and …

TiN hard coating as a candidate reference material for surface metrology in chemistry: characterization and quantification by bulk and surface analyses techniques

JM Juárez-García… - Revista de …, 2022 - revistademetalurgia.revistas.csic.es
This study presents the synthesis and characterization of TiN hard coatings as a candidate
reference material for surface metrology in chemistry. TiN coatings were grown on a silicon …