Laser-produced transient tin plasmas are the sources of extreme ultraviolet (EUV) light at
13.5 nm wavelength for next-generation nanolithography, enabling the continued …

Plasma produced from molten-tin microdroplets generates extreme ultraviolet light for state-
of-the-art nanolithography. Currently, CO 2 lasers are used to drive the plasma. In the future …

An experimental study of laser-produced plasmas is performed by irradiating a planar tin
target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength …

We experimentally investigate the emission of EUV light from a mass-limited laser-produced
plasma over a wide parameter range by varying the diameter of the targeted tin …

The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin
targets by several-ns-long 2 µm-wavelength laser pulses, are studied in the extreme …

Extreme-ultraviolet (EUV) spectra of Sn 13+− Sn 15+ ions have been measured in an
electron-beam ion trap (EBIT). A matrix inversion method is employed to unravel convoluted …

Experimental spectroscopic studies are presented, in a 5.5–25.5 nm extreme-ultraviolet
(EUV) wavelength range, of the light emitted from plasma produced by the irradiation of tin …

We demonstrate the efficient generation of extreme ultraviolet (EUV) light from laser-
produced plasma (LPP) driven by 2 μm wavelength laser light as an alternative for 10 μm …

Experimental scaling relations of the optical depth are presented for the emission spectra of
a tin-droplet-based, 1-μm-laser-produced plasma source of extreme-ultraviolet (EUV) light …

The emission spectra from an industrial, droplet-based, laser-produced plasma, extreme
ultraviolet light source for nanolithography are here presented and analyzed. The …