First assessment of hydrogen/brine/Saudi basalt wettability: implications for hydrogen geological storage

A Alanazi, A Al-Yaseri, M Mowafi, M Leila… - Frontiers in Earth …, 2023 - frontiersin.org
Introduction: Underground hydrogen (H2) storage is a prominent technique to enable a
large-scale H2-based economy as part of the global energy mix for net-zero carbon …

Band-gap tunability in partially amorphous silicon nanoparticles using single-dot correlative microscopy

CC Huang, Y Tang, M van der Laan… - ACS applied nano …, 2020 - ACS Publications
Silicon nanoparticles (Si-NPs) represent one of many types of nanomaterials, where the
origin of emission is difficult to assess due to a complex interplay between the core and …

Aerosol assisted atmospheric pressure chemical vapor deposition of silicon thin films using liquid cyclic hydrosilanes

S Guruvenket, JM Hoey, KJ Anderson, MT Frohlich… - Thin Solid Films, 2015 - Elsevier
Silicon (Si) thin films were produced using an aerosol assisted atmospheric pressure
chemical vapor deposition technique with liquid hydrosilane precursors cyclopentasilane …

The effects of argon and helium dilution in the growth of nc-Si: H thin films by plasma-enhanced chemical vapor deposition

F Chaibi, R Jemai, H Aguas, H Khemakhem… - Journal of materials …, 2018 - Springer
We used argon and helium gases to dilute silane to deposit silicon thin films by plasma-
enhanced chemical vapor deposition (PECVD). Obtained films were characterized by …

High-Throughput Low Frequency Reactor for Non-Thermal Plasma Synthesis of Amorphous Silicon Nanoparticles

SS Bubenov, AA Vinokurov, IV Yudin, VM Popelensky… - Silicon, 2024 - Springer
The purpose of this article is to increase availability and applicability of laboratory and
industrial scale non-thermal plasma synthesis of nanoparticles. To that end, the article …

Synthesis of vertically aligned carbon nanoflakes by hot-wire chemical vapor deposition: Influence of process pressure and different substrates

M Singh, HS Jha, P Agarwal - Thin Solid Films, 2019 - Elsevier
The vertically aligned carbon nanoflakes thin films were synthesized on Si (100) and alkali
free borosilicate glass substrates at relatively low substrate temperature of 400° C, without …

Highly-conductive B-doped nc-Si: H thin films deposited at room temperature by using SLAN ECR-PECVD

SE Lee, YC Park - Journal of the Korean Physical Society, 2014 - Springer
Highly-conductive B-doped nc-Si: H was deposited at room temperature by using electron
cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (PECVD) with a …

Growth of crystalline silicon by a seed layer approach using plasma enhanced chemical vapor deposition

M Khelil, S Kraiem, K Khirouni, S Alaya - Physica B: Condensed Matter, 2021 - Elsevier
Different processes are used to improve the deposition of a nanocrystalline silicon layer to
enhance optical absorption in different devices. The difficulty encountered lies in the …

Nanocrystalline Si: H thin films grown at room temperature with plasma-enhanced chemical vapour deposition at a very high pressure

L Gao, NP Lu, LG Liao, AL Ji… - Journal of Physics D …, 2012 - iopscience.iop.org
Hydrogenated nanocrystalline silicon (nc-Si: H) films were grown using the plasma-
enhanced chemical vapour deposition method, with the plasma operated under a gas …

[图书][B] Defects in Nanocrystals: Structural and Physico-chemical Aspects

S Pizzini - 2020 - taylorfrancis.com
Defects in Nanocrystals: Structural and Physico-Chemical Aspects discusses the nature of
semiconductor systems and the effect of the size and shape on their thermodynamic and …