The future transistors

W Cao, H Bu, M Vinet, M Cao, S Takagi, S Hwang… - Nature, 2023 - nature.com
The metal–oxide–semiconductor field-effect transistor (MOSFET), a core element of
complementary metal–oxide–semiconductor (CMOS) technology, represents one of the …

[HTML][HTML] A review of the gate-all-around nanosheet FET process opportunities

S Mukesh, J Zhang - Electronics, 2022 - mdpi.com
In this paper, the innovations in device design of the gate-all-around (GAA) nanosheet FET
are reviewed. These innovations span enablement of multiple threshold voltages and …

2D fin field-effect transistors integrated with epitaxial high-k gate oxide

C Tan, M Yu, J Tang, X Gao, Y Yin, Y Zhang, J Wang… - Nature, 2023 - nature.com
Precise integration of two-dimensional (2D) semiconductors and high-dielectric-constant (k)
gate oxides into three-dimensional (3D) vertical-architecture arrays holds promise for …

New structure transistors for advanced technology node CMOS ICs

Q Zhang, Y Zhang, Y Luo, H Yin - National Science Review, 2024 - academic.oup.com
Over recent decades, advancements in complementary metal-oxide-semiconductor
integrated circuits (ICs) have mainly relied on structural innovations in transistors. From …

Demonstration of germanium vertical gate-all-around field-effect transistors featured by self-aligned high-κ metal gates with record high performance

L Xie, H Zhu, Y Zhang, X Ai, J Li, G Wang, J Liu, A Du… - ACS …, 2023 - ACS Publications
A special Ge nanowire/nanosheet (NW/NS) p-type vertical sandwich gate-all-around (GAA)
field-effect transistor (FET)(Ge NW/NS pVSAFET) with self-aligned high-κ metal gates …

[HTML][HTML] Steep-slope vertical-transport transistors built from sub-5 nm Thin van der Waals heterostructures

Q Yang, ZD Luo, H Duan, X Gan, D Zhang, Y Li… - Nature …, 2024 - nature.com
Abstract Two-dimensional (2D) semiconductor-based vertical-transport field-effect
transistors (VTFETs)–in which the current flows perpendicularly to the substrate surface …

Neural network-based and modeling with high accuracy and potential model speed

CT Tung, MY Kao, C Hu - IEEE Transactions on Electron …, 2022 - ieeexplore.ieee.org
In this brief, we demonstrate a neural network (NN)-based device modeling framework. This
NN model is built to model advanced field-effect transistors (FETs). Specific transfer …

Semiconductor technology looks up

P Ball - Nature Materials, 2022 - nature.com
Moore's law been exaggerated? There's no doubt that physical limits must exist on how
much smaller the components on silicon chips can be made to maintain the trend in …

Vertical C-shaped-channel nanosheet FETs featured with precise control of both channel-thickness and gate-length

ZR Xiao, Q Wang, HL Zhu, Z Chen… - IEEE Electron …, 2022 - ieeexplore.ieee.org
A novel vertical C-shaped-channel nanosheet field-effect-transistor (VCNFET) featured with
precise control of channel-thickness and gate-length, and a unique integration flow of Dual …

[HTML][HTML] A perspective on electrical generation of spin current for magnetic random access memories

C Safranski, JZ Sun, AD Kent - Applied Physics Letters, 2022 - pubs.aip.org
Spin currents are used to write information in magnetic random access memory (MRAM)
devices by switching the magnetization direction of one of the ferromagnetic electrodes of a …