Multilayer Laue lens (MLL) is a new class of x-ray optics that offer great promise for
achieving nanometre-level spatial resolution by focusing hard x-rays. Fabricating an MLL via …

A process for the selective removal of a substance from a substrate for etching and/or
cleaning applications is disclosed herein. In one embodiment, there is provided a process …

We developed Al 2 O 3/W heterogeneous nanopore arrays for field effect modulated
nanofluidic diodes. They are fabricated by transferring self-organized nanopores of anodic …

This paper investigates a low damage reactive ion etch (RIE) process to make thin silicon
nitride sidewall spacers for the fabrication of self-aligned sub-100nm gate length III–V metal …

Tungsten single crystal and poly crystal were treated by electrolytic etching in a 3% by
weight solution of NaOH in distilled water. The method for determining the proportion of …

Esta tese apresenta os resultados do desenvolvimento e da otimização de uma tecnologia
própria na área de fabricação de dispositivos CMOS e Microssistemas, realizados no …

In this study, we investigate in situ optical emission spectra from plasma in the reactive ion
etching (RIE) of tungsten, a suitable candidate for gate metallization in compound …

Microplasmas are currently used in displays, two-terminal breakdown switches, light
sources, and medical instruments. They can also be used in miniaturized particle …

Nanopantography is a new patterning method for massively parallel writing of nanofeatures
over large areas. Billions of electrostatic lenses are first fabricated on top of a Si wafer using …

For the last two decades, significant and rapid advances in the growth and technology of III-
N related semiconductors have yielded exciting performance for optical and electronic …