Fabry-Perot laser with wavelength control

RJ Mears, A Yiptong, AD Cohen - US Patent 6,741,624, 2004 - Google Patents
(57) ABSTRACT A laser device, in particular a semiconductor laser, emitting optical
radiation With a de? ned mode pattern can be pro duced from a standard Fabry-Perot (FP) …

Configurable aperiodic grating device

RJ Mears, MC Parker - US Patent 7,123,792, 2006 - Google Patents
The invention relates to the field of grating structures. The invention provides a longitudinal
grating having an aperi odic structure, wherein the grating has a selected response …

Optical filter device with aperiodically arranged grating elements

RJ Mears, MC Parker - US Patent 6,993,222, 2006 - Google Patents
A method for producing aperiodic gratings and waveguides with aperiodic gratings uses a
simulated annealing process that starts with a random configuration of grating elements and …

Predictive model for scanned probe oxidation kinetics

JA Dagata, F Perez-Murano, G Abadal… - Applied Physics …, 2000 - pubs.aip.org
Previous descriptions of scanned probe oxidation kinetics involved implicit assumptions that
one-dimensional, steady-state models apply for arbitrary values of applied voltage and …

Peculiarities of an anomalous electronic current during atomic force microscopy assisted nanolithography on n-type silicon

SF Lyuksyutov, PB Paramonov, I Dolog… - …, 2003 - iopscience.iop.org
We report the observation of anomalously high currents of up to 500µA during direct oxide
nanolithography on the surface of n-type silicon {100}. Conventional nanolithography on …

Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching

FSS Chien, WF Hsieh, S Gwo, AE Vladar… - Journal of Applied …, 2002 - pubs.aip.org
Fabrication of silicon nanostructures is a key technique for the development of monolithically
integrated optoelectronic circuits. We demonstrated that the process of scanning probe …

A Fourier (k-) space design approach for controllable photonic band and localization states in aperiodic lattices

S Chakraborty, MC Parker, RJ Mears - Photonics and Nanostructures …, 2005 - Elsevier
In this paper we present a systematic study of photonic bandgap engineering using
aperiodic lattices (ALs). Up to now ALs have tended to be defined by specific formulae (eg …

Selective plasma nitridation and contrast reversed etching of silicon

S Sharma, MK Sunkara, MM Crain… - Journal of Vacuum …, 2001 - pubs.aip.org
A new method of selectively patterning a silicon substrate with silicon dioxide and silicon
nitride is demonstrated. An oxide patterned silicon substrate is directly nitrided using a …

High aspect ratio etching of atomic force microscope-patterned nitrided silicon

SA Harfenist, MM Yazdanpanah… - Journal of Vacuum Science …, 2003 - pubs.aip.org
Silicon that is nitrided in a pure nitrogen plasma is patterned with voltage applied by an
atomic force microscope (AFM). Wet chemical etching into AFM-patterned (110) silicon …

Characterization of prototype silicon pitch artifacts fabricated by scanning probe lithography and anisotropic wet etching

FSS Chien, WF Hsieh, S Gwo, J Jun… - Journal of Vacuum …, 2005 - pubs.aip.org
Scanning probe lithography (SPL) and anisotropic tetra-methyl ammonium hydroxide
(TMAH) etching (SPL+ TMAH) were used to fabricate a series of one-dimensional prototype …