P Janssens, K Vermeirsch - US Patent 9,466,941, 2016 - Google Patents
(57) ABSTRACT A patterned retarder is described that may be used with a laser source array to obtain a combined beam suitable for laser image projection (eg, three-dimensional …
C Dezelah, V Sharma - US Patent 11,574,813, 2023 - Google Patents
H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, eg PN junction …
V Yankov, A Goltsov, I Ivonin, K Kravtsov… - US Patent …, 2014 - Google Patents
Disclosed is a liquid-crystal display with coherent illumina tion. The display has a multilayered matrix structure compris ing a matrix of micromirrors, lightguide panel with a …
DG Baker - US Patent 9,541,494, 2017 - Google Patents
(51) Int. Cl. A method for measuring a quality parameter, Such as lumi G06F II/30(2006.01) nance uniformity, of a video display, according to some GOIN 2L/25(2006.01) embodiments …
TE Blomberg, V Sharma, SP Haukka… - US Patent …, 2024 - Google Patents
Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially …
C Dezelah, V Sharma - US Patent 12,040,195, 2024 - Google Patents
Atomic layer etching (ALE) processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which a substrate comprising a metal, metal oxide, metal …
TE Blomberg, V Sharma - US Patent 11,948,813, 2024 - Google Patents
To create constant partial pressures of the by-products and residence time of the gas molecules across the wafer, a dual showerhead reactor can be used. A dual showerhead …
V Yankov, I Ivonin, A Goltsov, K Kravtsov… - US Patent …, 2014 - Google Patents
Proposed is a speckle-reduced laser illumination device that may be used in optical microscopy, machine vision systems with laser illumination, fine optical metrology, etc. The …
TE Blomberg, V Sharma, S Haukka… - US Patent …, 2023 - Google Patents
Thermal atomic layer etching processes are disclosed. In some embodiments, the methods comprise at least one etch cycle in which the substrate is alternately and sequentially …