Dielectric charging in silicon nitride films for MEMS capacitive switches: Effect of film thickness and deposition conditions

U Zaghloul, G Papaioannou, F Coccetti, P Pons… - Microelectronics …, 2009 - Elsevier
The paper presents a systematic investigation of the dielectric charging and discharging
process in silicon nitride thin films for RF-MEMS capacitive switches. The SiN films were …

On the influence of environment gases, relative humidity and gas purification on dielectric charging/discharging processes in electrostatically driven MEMS/NEMS …

U Zaghloul, B Bhushan, P Pons… - …, 2010 - iopscience.iop.org
In this paper, we investigate the impact of environment gases and relative humidity on
dielectric charging phenomenon in electrostatically actuated micro-and nano …

Nanoscale characterization of the dielectric charging phenomenon in PECVD silicon nitride thin films with various interfacial structures based on Kelvin probe force …

U Zaghloul, GJ Papaioannou, H Wang… - …, 2011 - iopscience.iop.org
This work presents a novel characterization methodology for the dielectric charging
phenomenon in electrostatically driven MEMS devices using Kelvin probe force microscopy …

Effect of deposition gas ratio, RF power, and substrate temperature on the charging/discharging processes in PECVD silicon nitride films for electrostatic NEMS/MEMS …

U Zaghloul, GJ Papaioannou… - Journal of …, 2011 - ieeexplore.ieee.org
The dependence of the electrical properties of silicon nitride, which is a commonly used
dielectric in nano-and micro-electromechanical systems (NEMS and MEMS), on the …

A novel low cost failure analysis technique for dielectric charging phenomenon in electrostatically actuated MEMS devices

U Zaghloul, F Coccetti, GJ Papaioannou… - 2010 IEEE …, 2010 - ieeexplore.ieee.org
This work presents a novel failure analysis technique for the dielectric charging
phenomenon in electrostatically driven MEMS devices. The new reliability assessment …

A comprehensive study for dielectric charging process in silicon nitride films for RF MEMS switches using Kelvin probe microscopy

U Zaghloul, A Belarni, F Coccetti… - … Solid-State Sensors …, 2009 - ieeexplore.ieee.org
In this work we present for the first time a systematic investigation for the dielectric charging
in silicon nitride films for RF MEMS capacitive switches based on Kelvin probe microscopy …

New insights into reliability of electrostatic capacitive RF MEMS switches

U Zaghloul, GJ Papaioannou, B Bhushan… - International Journal of …, 2011 - cambridge.org
Among other reliability concerns, the dielectric charging is considered the major failure
mechanism which hinders the commercialization of electrostatic capacitive radio frequency …

[PDF][PDF] Nanoscale and macroscale characterization of the dielectric charging phenomenon and stiction mechanisms for electrostatic MEMS/NEMS reliability

UZ Heiba - 2011 - core.ac.uk
This chapter provides an overview of the presently available knowledge related to the
reliability of electrostatic capacitive MEMS switches with a main focus on the dielectric …

[PDF][PDF] Effect of deposition reactive gas ratio, RF power and substrate temperature on the charging/discharging processes in PECVD silicon nitride films based on …

R Plana - 2011 - Citeseer
The dependence of the electrical properties of silicon nitride on the deposition conditions
used to prepare it and consequently on material stoichiometry has not been fully …