Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th
anniversary of the Institute of Spectroscopy, Russian Academy of Sciences) - IOPscience …

Abstract This Feature Article discusses two biomimetic aspects of functional particle surface
assembly: the fabrication of biologically inspired structures from particles and the …

Проекционная фотолитография (или просто литография) является одним из ключевых
технологических процессов современной микроэлектронной промышленности …

The important role of grain boundaries for the mechanical properties of polycrystalline
materials has been recognized for many decades. Up to now, the underlying deformation …

Development of laser-produced plasma “water window” sources poses a major challenge in
x-ray research and most effort has focused on line sources for use with zone plate optics …

A novel hybrid method that combines the laser-focused atomic deposition (LFAD) and
extreme ultraviolet (EUV) interference lithography has been introduced. The Cr grating …

[en] The soft X-ray interference lithography (XIL) branch beamline at Shanghai Synchrotron
Radiation Facility (SSRF) is briefly introduced in this article. It is designed for obtaining 1D …

A device was designed and assembled to analyze the outgassing of molecular glass (MG)
photoresists under extreme ultraviolet (EUV) exposure. The outgassing of the photoresists …

We present the first experimental demonstration of a novel type of narrowband and
wavelength-tunable multilayer transmission filter for the extreme ultraviolet (EUV) region …

In 2009 industry announced that sources would be needed at 6. x nm for future lithography.
The brightest sources in this wavelength region are plasmas containing gadolinium and …