Data-driven science and technology offer transformative tools and methods to science. This
review article highlights the latest development and progress in the interdisciplinary field of …

Abstract Advanced Process Control (APC) has become an increasingly pressing issue for
the semiconductor industry, particularly in the new era of sub-5nm process technology. To …

Virtual metrology (VM) has been employed to improve the performance of advanced process
control for semiconductor manufacturing. A number of VM models have been proposed to …

In the semiconductor etch process, as the critical dimension (CD) decreases and the
difficulty of the process control increases, in-situ and real-time etch profile monitoring …

This paper proposes a fused lasso model to identify significant features in the spectroscopic
signals obtained from a semiconductor manufacturing process, and to construct a reliable …

Meter-scale of the large area inductively coupled plasma etchers with the capacitive power
coupling are widely applied for the mass production of OLED (organic light emitting diode) …

This study practiced virtual metrology (VM) for the etch profile and depth in the deep silicon
trench etching with SF 6/O 2/Ar plasma. Machine learning-based VM models constitute the …

Integrated circuits (IC) are fabricated on a wafer through stacked layers of circuit patterns. To
ensure proper functionality, the overlay of each pattern layer must be within the tolerance …

In this paper, we review the development of plasma engineering technology that improves
dramatically the production efficiency of OLED (organic light-emitting diode) displays and …

The current thin film transistor liquid crystal display (TFT-LCD) panel industry evolves in
transition from volume production to customized production service as a major competition …