Directed self-assembly of block copolymers for nanocircuitry fabrication
MA Morris - Microelectronic Engineering, 2015 - Elsevier
This paper is a perspective on progress that has been made in the use of block copolymers
as potential, non-UV lithographically formed, on-chip etch masks for the fabrication of ultra …
as potential, non-UV lithographically formed, on-chip etch masks for the fabrication of ultra …
Directed self-assembly of block copolymers for the fabrication of functional devices
Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that
has attracted high interest in recent years due to its inherent simplicity, high throughput, low …
has attracted high interest in recent years due to its inherent simplicity, high throughput, low …
Ultrathin random copolymer-grafted layers for block copolymer self-assembly
Hydroxyl-terminated P (Sr-MMA) random copolymers (RCPs) with molecular weights (M n)
from 1700 to 69000 and a styrene unit fraction of approximately 61% were grafted onto a …
from 1700 to 69000 and a styrene unit fraction of approximately 61% were grafted onto a …
Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer
'Directing'block copolymer (BCP) patterns is a possible option for future semiconductor
device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently …
device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently …
A Universal Approach to Fabricating 3D Chemical Patterns for Directed Self-Assembly of Block Copolymers with Density Multiplication
Directed self-assembly (DSA) of block copolymers (BCPs) with density multiplication has
been proved to be a viable technique for the fabrication of FinFET at the 7 nm node. The key …
been proved to be a viable technique for the fabrication of FinFET at the 7 nm node. The key …
Design and preparation of highly structure-controllable mesoporous carbons at the molecular level and their application as electrode materials for supercapacitors
K Yan, LB Kong, YH Dai, M Shi, KW Shen… - Journal of Materials …, 2015 - pubs.rsc.org
Highly structure-controllable mesoporous carbons (HSCMCs) were prepared through a
simple carbonization procedure using well-controlled diblock copolymer precursors. We …
simple carbonization procedure using well-controlled diblock copolymer precursors. We …
Fabrication of ordered, large scale, horizontally aligned Si nanowire arrays based on an in-situ hard mask block copolymer approach
A simple technique is demonstrated to fabricate horizontal, uniform, and hexagonally
arranged Sinanowire arrays with controlled orientation and density at spatially well defined …
arranged Sinanowire arrays with controlled orientation and density at spatially well defined …
Ultrafast Assembly of PS‐PDMS Block Copolymers on 300 mm Wafers by Blending with Plasticizers
J Arias‐Zapata, S Böhme, J Garnier… - Advanced Functional …, 2016 - Wiley Online Library
Next‐generation lithography techniques based on the self‐assembly of block copolymers
(BCPs) are promising methods for high‐resolution pattering. BCPs with a high …
(BCPs) are promising methods for high‐resolution pattering. BCPs with a high …
Hydrogen bond interactions mediate hierarchical self-assembly of POSS-containing block copolymers blended with phenolic resin
CW Chiou, YC Lin, L Wang, R Maeda… - …, 2014 - ACS Publications
Poly (methyl methacrylate)-b-poly (methacryloyl polyhedral oligomeric silsesquioxane)(
PMMA-b-PMAPOSS) block copolymers of various compositions were prepared through …
PMMA-b-PMAPOSS) block copolymers of various compositions were prepared through …
Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by …
The self-assembly of a lamellar-forming polystyrene-block-poly (dimethylsiloxane)(PS-b-
PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The …
PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The …