A review of machine learning for the optimization of production processes

D Weichert, P Link, A Stoll, S Rüping… - … International Journal of …, 2019 - Springer
Due to the advances in the digitalization process of the manufacturing industry and the
resulting available data, there is tremendous progress and large interest in integrating …

Big data analytics in chemical engineering

L Chiang, B Lu, I Castillo - Annual review of chemical and …, 2017 - annualreviews.org
Big data analytics is the journey to turn data into insights for more informed business and
operational decisions. As the chemical engineering community is collecting more data …

A comparison study of basic data-driven fault diagnosis and process monitoring methods on the benchmark Tennessee Eastman process

S Yin, SX Ding, A Haghani, H Hao, P Zhang - Journal of process control, 2012 - Elsevier
This paper provides a comparison study on the basic data-driven methods for process
monitoring and fault diagnosis (PM–FD). Based on the review of these methods and their …

Total projection to latent structures for process monitoring

D Zhou, G Li, SJ Qin - AIChE journal, 2010 - Wiley Online Library
Partial least squares or projection to latent structures (PLS) has been used in multivariate
statistical process monitoring similar to principal component analysis. Standard PLS often …

Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing

CF Chien, WT Hung, CW Pan… - Computers & Industrial …, 2022 - Elsevier
Virtual metrology (VM) has been employed to improve the performance of advanced process
control for semiconductor manufacturing. A number of VM models have been proposed to …

Adaptive virtual metrology for semiconductor chemical mechanical planarization process using GMDH-type polynomial neural networks

X Jia, Y Di, J Feng, Q Yang, H Dai, J Lee - Journal of Process Control, 2018 - Elsevier
Virtual metrology (VM) is drawing more and more attention in the recent research of wafer to
wafer control for semiconductor manufacturing. Although many different approaches for VM …

Virtual metrology in semiconductor manufacturing: Current status and future prospects

V Maitra, Y Su, J Shi - Expert Systems with Applications, 2024 - Elsevier
Abstract Advanced Process Control (APC) has become an increasingly pressing issue for
the semiconductor industry, particularly in the new era of sub-5nm process technology. To …

Wafer classification using support vector machines

R Baly, H Hajj - IEEE Transactions on Semiconductor …, 2012 - ieeexplore.ieee.org
Increasing yield is a primary concern to integrated circuit manufacturing companies as it
dictates the readiness of a new process for high volume manufacturing. In order to expedite …

An approach for factory-wide control utilizing virtual metrology

AA Khan, JR Moyne, DM Tilbury - IEEE Transactions on …, 2007 - ieeexplore.ieee.org
In the semiconductor manufacturing industry, market demands and technology trends drive
manufacturers towards increases in wafer size and decreases in device size. Application of …

Study on modifications of PLS approach for process monitoring

S Yin, SX Ding, P Zhang, A Hagahni, A Naik - IFAC Proceedings Volumes, 2011 - Elsevier
Partial least squares (PLS) is an efficient approach for multivariate statistical process
monitoring. Although it works in many industrial applications, Zhou et al.[2010] revealed that …