Perspective on ferroelectric devices: lessons from interfacial chemistry

K Yang, SH Kim, HW Jeong, DH Lee… - Chemistry of …, 2023 - ACS Publications
Ferroelectric fluorite-structured oxide thin films have attracted increased interest from both
academia and industry because of their superior scalability─ in which their ferroelectric …

Influence of Biaxial Strain and Interfacial Layer Growth on Ferroelectric Wake-Up and Phase Transition Fields in ZrO2

B Xu, R Ganser, KM Holsgrove, X Wang… - … Applied Materials & …, 2024 - ACS Publications
Investigations on fluorite-structured ferroelectric HfO2/ZrO2 thin films are aiming to achieve
high-performance films required for memory and computing technologies. These films …

Transistors with ferroelectric ZrXAl1−XOY crystallized by ZnO growth for multi-level memory and neuromorphic computing

MM Islam, A Ali, C Park, T Lim, DY Woo… - Communications …, 2024 - nature.com
Ferroelectric (FE) field-effect transistors are interesting for their non-destructive readout
characteristic and energy efficiency but are difficult to integrate on silicon platforms. Here, FE …

Low Voltage High Polarization by Optimizing Scavenged WNx Interfacial Capping Layer at the Ru/HfxZr1‐xO2 Interface and Evidence of Fatigue Mechanism

A Aich, A Senapati, ZF Lou, YP Chen… - Advanced Materials …, 2024 - Wiley Online Library
In this study, the double remnant polarization (2Pr) is enhanced from≈ 2 to 25 µC cm− 2 at a
low applied voltage of±2 V (or from 10 to 35 µC cm− 2 at a voltage of±4 V) by decreasing the …

Boosting non-volatile memory performance with exhalative annealing: A novel approach to low-temperature crystallization of hafnia based ferroelectric

Y Lee, UJ Kim, K Kim, DJ Yun, D Choe, S Yoo… - Materials Today …, 2024 - Elsevier
In this study, we propose a CMOS-compatible exhalative annealing (EA) method that can
significantly reduce the annealing temperature of Zr-doped hafnia-based ferroelectrics …

Nanoscale Phase and Orientation Mapping in Multiphase Polycrystalline Hafnium Zirconium Oxide Thin Films Using 4D‐STEM and Automated Diffraction Indexing

G Baucom, E Hershkovitz, P Chojecki, T Nishida… - Small …, 2024 - Wiley Online Library
Ferroelectric hafnium zirconium oxide (HZO) holds promise for nextgeneration memory and
transistors due to its superior scalability and seamless integration with complementary metal …

Photoinduced patterning of oxygen vacancies to promote the ferroelectric phase of Hf0. 5Zr0. 5O2

TE Beechem, F Vega, ST Jaszewski… - Applied Physics …, 2024 - pubs.aip.org
Photoinduced reductions in the oxygen vacancy concentration were leveraged to increase
the ferroelectric phase fraction of Hf 0.5 Zr 0.5 O 2 thin-films. Modest (⁠∼ 2− 77 pJ/cm 2⁠) …

Tunable defect engineering of Mo/TiON electrode in angstrom-laminated HfO2/ZrO2 ferroelectric capacitors towards long endurance and high temperature retention

SM Wang, CR Liu, YT Chen, SC Lee, YT Tang - Nanotechnology, 2024 - iopscience.iop.org
A novel defect control approach based on laminated HfO 2/ZrO 2 with multifunctional
TiN/Mo/TiO x N y electrode is proposed to significantly improve the endurance and data …

Role of Ferroelectric Layer Thickness in Resistive Switching and Depolarization Effects in Hf0.5Zr0.5O2-Based Structures

IA Savichev, IG Margolin, RI Romanov… - IEEE Transactions on …, 2025 - ieeexplore.ieee.org
The development of low-power and high-density ferroelectric memories requires scaling the
thickness of the functional layer. However, the thickness could have a significant impact on …

Enabling Low-Power Charge-Domain Nonvolatile Computing-in-Memory (CIM) With Ferroelectric Memcapacitor

X Wang, BY Cui, L Jing, X Wang, M Wu… - … on Electron Devices, 2024 - ieeexplore.ieee.org
The explosive growth in data-centric computing driven by artificial intelligence (AI) and big
data has surpassed the capabilities of the traditional von Neumann architecture. The …