Thermal atomic layer etching (ALE) can be achieved using sequential, self-limiting
fluorination and ligand-exchange reactions. Previous studies have demonstrated thermal …

Thin film dielectrics are ubiquitous in the manufacture of electronic devices and are
frequently deposited and etched away at various stages of device fabrication. We …

This thesis presents a collection of work investigating the application of hafnium oxide
(HfO2) thin films as both wet-chemical and surface-state passivation layers for photovoltaic …

Chemical systems that contain transition metals or are far from their equilibrium geometries
are often impossible to describe with a single electronic configuration. These problems …