[HTML][HTML] Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film
Ion irradiation is a key tool for controlling the nanostructure, phase content, and physical
properties of refractory ceramic thin films grown at low temperatures by magnetron …
properties of refractory ceramic thin films grown at low temperatures by magnetron …
A review of the intrinsic ductility and toughness of hard transition-metal nitride alloy thin films
Over the past decades, enormous effort has been dedicated to enhancing the hardness of
refractory ceramic materials. Typically, however, an increase in hardness is accompanied by …
refractory ceramic materials. Typically, however, an increase in hardness is accompanied by …
[HTML][HTML] Bipolar HiPIMS for tailoring ion energies in thin film deposition
J Keraudy, RPB Viloan, MA Raadu, N Brenning… - Surface and Coatings …, 2019 - Elsevier
The effects of a positive pulse following a high-power impulse magnetron sputtering
(HiPIMS) pulse are studied using energy-resolved mass spectrometry. This includes …
(HiPIMS) pulse are studied using energy-resolved mass spectrometry. This includes …
Metal-ion subplantation: A game changer for controlling nanostructure and phase formation during film growth by physical vapor deposition
G Greczynski, S Mráz, JM Schneider… - Journal of Applied …, 2020 - pubs.aip.org
Up until recently, thin film growth by magnetron sputtering relied on enhancing adatom
mobility in the surface region by gas-ion irradiation to obtain dense layers at low deposition …
mobility in the surface region by gas-ion irradiation to obtain dense layers at low deposition …
[HTML][HTML] Copper thin films deposited using different ion acceleration strategies in HiPIMS
The growth of Cu thin films by low-energy ion-bombardment using bipolar and conventional
HiPIMS pulse configurations to the target in combination with different biasing methods of …
HiPIMS pulse configurations to the target in combination with different biasing methods of …
Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias
The effect of applying a positive voltage pulse (U rev= 10–150 V) directly after the negative
high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated …
high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated …
Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements
The plasma potential at a typical substrate position is studied during the positive pulse of a
bipolar high-power impulse magnetron sputtering (bipolar HiPIMS) discharge with a Cu …
bipolar high-power impulse magnetron sputtering (bipolar HiPIMS) discharge with a Cu …
Deposition of highly crystalline AlScN thin films using synchronized high-power impulse magnetron sputtering: From combinatorial screening to piezoelectric devices
J Patidar, K Thorwarth, T Schmitz-Kempen… - Physical Review …, 2024 - APS
With the integration of 5G in day-to-day devices and the foreseeable 6G revolution, demand
for advanced radio frequency (RF) microelectromechanical systems (MEMS) is growing …
for advanced radio frequency (RF) microelectromechanical systems (MEMS) is growing …
Phase composition of polycrystalline HfNx (0.45≤ x≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties
We have investigated the phase composition of HfN x as a function of x and the effects of low-
energy ion irradiation on the microstructure and physical properties of polycrystalline layers …
energy ion irradiation on the microstructure and physical properties of polycrystalline layers …
[HTML][HTML] Low temperature growth of stress-free single phase α-W films using HiPIMS with synchronized pulsed substrate bias
Efficient metal-ion-irradiation during film growth with the concurrent reduction of gas-ion-
irradiation is realized for high power impulse magnetron sputtering by the use of a …
irradiation is realized for high power impulse magnetron sputtering by the use of a …