With the development of microelectronics, the demand for continuously miniaturized feature
sizes has driven continuous progress in lithography technology. Extreme ultraviolet (EUV) …

Stimuli-responsive organic-inorganic mesoporous silica hybrid materials have attracted
significant attention because of their tuning properties that enable a wide range of …

Abstract High performance Mg 2+/Li+ separation membranes are needed to meet the rising
demands for lithium supply, yet state-of-the-art polyamide nanofiltration membranes show …

Nonchemically amplified resists based on triphenyl sulfonium triflate-modified polystyrene
(PSTS) were prepared by a facile method of modification of polystyrene with sulfonium …

In this study, a series of molecular resists based on a bis (4-butoxyphenyl) sulfone core
attached to a varying number of radiation-sensitive triphenylsulfonium units (BPSS n, where …

A novel molecular glass compound (AD-10Boc) based on adamantane derivatives was
synthesized and characterized. The thermal analysis indicated that a glass transition …

As the crucial dimension (CD) of logic circuits continues to shrink, the photoresist metrics,
including resolution, line edge roughness, and sensitivity, are faced with significant …

A series of t-butyloxycarbonyl (t-Boc) protected tetraphenylsilane derivatives (TPSi-Boc x, x=
60, 70, 85, 100%) were synthesized and used as resist materials to investigate the effect of t …

Both the cluster chemistry of tin and lanthanides have attracted extensive research interest,
showing wide applications in catalysis, magnetism, luminescence, and lithography …

Motivated by the drawbacks of solution phase processing, an all‐dry resist formation
process is presented that utilizes amorphous zinc‐imidazolate (aZnMIm) films deposited by …