Background: The successful introduction of extreme ultraviolet (EUV) lithography to high
volume manufacturing has increased the interest to push this technology to its ultimate limits …

The attenuated phase-shift mask (Att. PSM) is proven to be a promising resolution
enhancement technology (RET) to improve the imaging performance in extreme ultraviolet …

Photomasks are expected to have phase effects near edges due to their 3D topography,
which can be modeled as imaginary boundary layers in thin mask simulations. We apply a …

Optical lithography is the process of imaging patterns from a pre-inscribed mask to a
photosensitive resist coating on wafer, etching which transcribes the patterns onto the wafer …

Optical projection lithography is the predominant microlithography technique that is used in
the semiconductor fabrication process. It uses light to transfer the information from a …