New approaches to nanofabrication: molding, printing, and other techniques

BD Gates, Q Xu, M Stewart, D Ryan, CG Willson… - Chemical …, 2005 - ACS Publications
“Nanofabrication” is the process of making functional structures with arbitrary patterns
having minimum dimensions currently defined (more-or-less arbitrarily) to be e100 nm …

Nanomachining by colloidal lithography

SM Yang, SG Jang, DG Choi, S Kim, HK Yu - Small, 2006 - Wiley Online Library
Colloidal lithography is a recently emerging field; the evolution of this simple technique is
still in progress. Recent advances in this area have developed a variety of practical routes of …

Lithographic apparatus and device manufacturing method

J Lof, ATAM Derksen, CA Hoogendam… - US Patent …, 2005 - Google Patents
US6952253B2 - Lithographic apparatus and device manufacturing method - Google
Patents US6952253B2 - Lithographic apparatus and device manufacturing method …

Lithographic apparatus and device manufacturing method

J Lof, ETM Bijlaart, H Butler, SNL Donders… - US Patent …, 2007 - Google Patents
A lithographic projection apparatus is disclosed in which a space between the projection
system and the substrate is filled with a liquid. An edge seal member at least partly …

Lithographic apparatus and device manufacturing method with substrate measurement not through liquid

J Lof, JT De Smit, RAS Ritsema, K Simon… - US Patent …, 2007 - Google Patents
A map of the surface of a substrate is generated at a measurement station. The substrate is
then moved to where a space between a projection lens and the substrate is filled with a …

Lithographic apparatus and device manufacturing method

J Lof, JT De Smit, RAS Ritsema, K Simon… - US Patent …, 2006 - Google Patents
DD 221 S63 4f1985 DE 224448 7, 1985 DE 242880 2, 1987 EP OO23231 2, 1981 EP
O418427 3, 1991 EP 10395.11 9, 2000 FR 2474708 T 1981 JP 58-202448 11, 1983 JP 62 …

Lithographic apparatus and device manufacturing method

ATAM Derksen, SNL Donders, CA Hoogendam… - US Patent …, 2006 - Google Patents
In a lithographic projection apparatus, a liquid supply system provides liquid in a space
between the final element of the projection system and the substrate of the lithographic …

Immersion Lithography at 157 nm

M Switkes, M Rothschild - Journal of Vacuum Science & Technology B …, 2001 - pubs.aip.org
We present a preliminary study on the feasibility of immersion lithography at 157 nm for
patterning below 70 nm. This technology can enable an enhancement in resolution of∼ …

Gradient immersion lithography

D Flagello, J Doering - US Patent 6,954,256, 2005 - Google Patents
In a lithographic projection apparatus, a space between an optical element is filled with a
first fluid and a second fluid separated by a transparent plate. The first and second fluids …

Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus

JCH Mulkens, MA Van Den Brink… - US Patent 7,589,818, 2009 - Google Patents
(56) References Cited A detector detects liquid in the path of a projection beam or US
PATENT DOCUMENTS alignment beam. A controller then determines which one or more of …