Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application
Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …
realizable complementary tool to aid optical patterning of device elements for future …
From atoms to lives: The evolution of nanoparticle assemblies
Z Xue, C Yan, T Wang - Advanced Functional Materials, 2019 - Wiley Online Library
Nanoparticle (NP) assemblies have been studied over the past several decades, and the
field is advancing more quickly and reaching into more diverse fields. Reports issued from …
field is advancing more quickly and reaching into more diverse fields. Reports issued from …
Autonomous discovery of emergent morphologies in directed self-assembly of block copolymer blends
The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful approach to
fabricate complex nanostructure arrays, but finding morphologies that emerge with changes …
fabricate complex nanostructure arrays, but finding morphologies that emerge with changes …
The chemical physics of sequential infiltration synthesis—A thermodynamic and kinetic perspective
Sequential infiltration synthesis (SIS) is an emerging materials growth method by which
inorganic metal oxides are nucleated and grown within the free volume of polymers in …
inorganic metal oxides are nucleated and grown within the free volume of polymers in …
The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography
We explore the lithographic limits of lamellae-forming PS-b-PMMA block copolymers by
performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials …
performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials …
Determining the shape and periodicity of nanostructures using small-angle x-ray scattering
The semiconductor industry is exploring new metrology techniques capable of meeting the
future requirement to characterize three-dimensional structure where the critical dimensions …
future requirement to characterize three-dimensional structure where the critical dimensions …
[图书][B] Metrology and Diagnostic Techniques for Nanoelectronics
Z Ma, DG Seiler - 2017 - taylorfrancis.com
Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …
Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities
Creating inorganic nanostructures for development of nanoelectronic device components is
a highly active research area. The ability for manipulation of the chemistry of materials, as …
a highly active research area. The ability for manipulation of the chemistry of materials, as …
Confinement and Processing Can Alter the Morphology and Periodicity of Bottlebrush Block Copolymers in Thin Films
Bottlebrush block copolymers (BBCPs) are intriguing architectural variations on linear BCPs
with highly tunable structure. Confinement can have a significant impact on polymer …
with highly tunable structure. Confinement can have a significant impact on polymer …
Quantitative three-dimensional characterization of block copolymer directed self-assembly on combined chemical and topographical prepatterned templates
Characterization of the three-dimensional (3D) structure in directed self-assembly (DSA) of
block copolymers is crucial for understanding the complex relationships between the …
block copolymers is crucial for understanding the complex relationships between the …