Passivation of III–V surfaces with crystalline oxidation

P Laukkanen, MPJ Punkkinen, M Kuzmin… - Applied Physics …, 2021 - pubs.aip.org
Control of interfacial physicochemical properties associated with device materials to
minimize the impact of point defects on device performance has been a dominant theme in …

High-quality-factor AlGaAs-on-sapphire microring resonators

Y Zheng, M Pu, HK Sahoo, E Semenova… - Journal of Lightwave …, 2019 - opg.optica.org
We realize an AlGaAs-on-sapphire platform through-assisted direct wafer bonding and
substrate removal processes. The direct wafer bonding process is optimized concerning the …

Low temperature bonding of heterogeneous materials using Al2O3 as an intermediate layer

HK Sahoo, L Ottaviano, Y Zheng, O Hansen… - Journal of Vacuum …, 2018 - pubs.aip.org
Integration of heterogeneous materials is crucial for many nanophotonic devices. The
integration is often achieved by bonding using polymer adhesives or metals. A much better …

Novel capacitive sensing system design of a microelectromechanical systems accelerometer for gravity measurement applications

Z Li, WJ Wu, PP Zheng, JQ Liu, J Fan, LC Tu - Micromachines, 2016 - mdpi.com
This paper presents an in-plane sandwich nano-g microelectromechanical systems (MEMS)
accelerometer. The proof-mass fabrication is based on silicon etching through technology …

Adhesive wafer bonding with ultra-thin intermediate polymer layers

SJ Bleiker, V Dubois, S Schröder, G Stemme… - Sensors and Actuators A …, 2017 - Elsevier
Wafer bonding methods with ultra-thin intermediate bonding layers are critically important in
heterogeneous 3D integration technologies for many NEMS and photonic device …

Design and analysis of 2-μm InGaSb/GaSb quantum well Lasers integrated onto Silicon-on-Insulator (SOI) waveguide circuits through an Al2O3 bonding layer

X Li, H Wang, Z Qiao, Y Zhang, Z Niu… - IEEE Journal of …, 2016 - ieeexplore.ieee.org
GaSb-based quantum well (QW) laser diode, with emission wavelength~ 2 μm, integrated
onto a silicon-on-insulator (SOI) waveguide circuit through a high-thermal-conductivity Al 2 …

Homogeneous chip to wafer bonding of InP-Al2O3-Si using UV/O3 activation

P Anantha, CS Tan - ECS Journal of Solid State Science and …, 2014 - iopscience.iop.org
A direct chip to wafer bonding of indium phosphide (InP) onto silicon using Al 2 O 3 as the
intermediate homogenous bonding layer is reported. Intermediate film thickness is varied …

Low temperature photosensitive polyimide based insulating layer formation for microelectromechanical systems applications

J Fan, T Zhu, WJ Wu, SH Tang, JQ Liu… - Journal of Electronic …, 2015 - Springer
Photosensitive polyimide (PSPI) based insulating layer fabrication for
microelectromechanical systems (MEMS) application has been systematically investigated …

[HTML][HTML] High-κ Al2O3 material in low temperature wafer-level bonding for 3D integration application

J Fan, LC Tu, CS Tan - AIP Advances, 2014 - pubs.aip.org
This work systematically investigated a high-κ Al 2 O 3 material for low temperature wafer-
level bonding for potential applications in 3D microsystems. A clean Si wafer with an Al 2 O …

UV/O3 assisted InP/Al2O3–Al2O3/Si low temperature die to wafer bonding

P Anantha, CS Tan - Microsystem Technologies, 2015 - Springer
Direct bonding of InP dies to Si wafer at low temperature utilizing Al 2 O 3 high-κ dielectric as
the interfacial material for homogeneous bonding is reported. The bonding technique is …