Emerging 2D metal oxides: from synthesis to device integration

K Zhou, G Shang, HH Hsu, ST Han… - Advanced …, 2023 - Wiley Online Library
Abstract 2D metal oxides have aroused increasing attention in the field of electronics and
optoelectronics due to their intriguing physical properties. In this review, an overview of …

van der Waals Contact for Two-Dimensional Transition Metal Dichalcogenides

L Ma, Y Wang, Y Liu - Chemical Reviews, 2024 - ACS Publications
Two-dimensional (2D) transition metal dichalcogenides (TMDs) have emerged as highly
promising candidates for next-generation electronics owing to their atomically thin structures …

Ohmic contact engineering for two-dimensional materials

Y Zheng, J Gao, C Han, W Chen - Cell Reports Physical Science, 2021 - cell.com
One of the major areas of semiconductor device research is the development of transparent
or ohmic contacts between semiconductors and metal electrodes for the efficient injection of …

Progress in Contact, Doping and Mobility Engineering of MoS2: An Atomically Thin 2D Semiconductor

A Rai, HCP Movva, A Roy, D Taneja, S Chowdhury… - Crystals, 2018 - mdpi.com
Atomically thin molybdenum disulfide (MoS2), a member of the transition metal
dichalcogenide (TMDC) family, has emerged as the prototypical two-dimensional (2D) …

Band offsets, Schottky barrier heights, and their effects on electronic devices

J Robertson - Journal of Vacuum Science & Technology A, 2013 - pubs.aip.org
The authors review the band line-ups and band offsets between semiconductors, dielectrics,
and metals, including the theory, experimental data, and the chemical trends. Band offsets …

The role of heterointerfaces and subgap energy states on transport mechanisms in silicon heterojunction solar cells

P Procel, H Xu, A Saez, C Ruiz‐Tobon… - Progress in …, 2020 - Wiley Online Library
The contact resistivity is a key parameter to reach high conversion efficiency in solar cells,
especially in architectures based on the so‐called carrier‐selective contacts. The …

Increase in current density for metal contacts to n-germanium by inserting TiO2 interfacial layer to reduce Schottky barrier height

JYJ Lin, AM Roy, A Nainani, Y Sun… - Applied Physics …, 2011 - pubs.aip.org
Metal contacts to n-type Ge have poor performance due to the Fermi level pinning near the
Ge valence band at metal/Ge interfaces. The electron barrier height can be reduced by …

Schottky Barrier Height Engineering in β-Ga2O3 Using SiO2 Interlayer Dielectric

A Bhattacharyya, P Ranga, M Saleh… - IEEE Journal of the …, 2020 - ieeexplore.ieee.org
This paper reports on the modulation of Schottky barrier heights (SBH) on three different
orientations of β-Ga 2 O 3 by insertion of an ultra-thin SiO 2 dielectric interlayer at the metal …

Clean Interface Contact Using a ZnO Interlayer for Low-Contact-Resistance MoS2 Transistors

J Jang, Y Kim, SS Chee, H Kim, D Whang… - … applied materials & …, 2019 - ACS Publications
Two-dimensional transition metal dichalcogenides (TMDCs) have emerged as promising
materials for next-generation electronics due to their excellent semiconducting properties …

Contact resistivity reduction through interfacial layer doping in metal-interfacial layer-semiconductor contacts

S Gupta, P Paramahans Manik… - Journal of Applied …, 2013 - pubs.aip.org
Metal-induced-gap-states model for Fermi-level pinning in metal-semiconductor contacts
has been extended to metal-interfacial layer (IL)-semiconductor (MIS) contacts using a …