Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials
AS Fisher, PS Goodall, MW Hinds… - Journal of Analytical …, 2005 - pubs.rsc.org
This atomic spectrometry update is the latest annual review under the title 'Industrial
Analysis' and follows on from last year's. In addition to this review, the reader is also directed …
Analysis' and follows on from last year's. In addition to this review, the reader is also directed …
New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications
SF Belykh, VV Palitsin, IV Veryovkin… - Review of Scientific …, 2007 - pubs.aip.org
A simple design for a cesium sputter ion source compatible with vacuum and ion-optical
systems as well as with electronics of the commercially available Cameca IMS-4f instrument …
systems as well as with electronics of the commercially available Cameca IMS-4f instrument …
A new limitation of the depth resolution in tof-sims elemental profiling: the influence of a probing ion beam
MN Drozdov, YN Drozdov, AV Novikov, PA Yunin… - Technical Physics …, 2018 - Springer
New data concerning the influence of a probing beam of bismuth ions on the depth
resolution in elemental depth profiling by secondary ion mass spectrometry (SIMS) have …
resolution in elemental depth profiling by secondary ion mass spectrometry (SIMS) have …