[HTML][HTML] In situ fragmentation of Al/Al2O3 multilayers on flexible substrates in biaxial tension

B Putz, TEJ Edwards, E Huszar, L Pethö, P Kreiml… - Materials & Design, 2023 - Elsevier
A unique deposition approach combining atomic layer deposition (ALD) and magnetron
sputtering was used to fabricate a series of thin film multilayer structures of Al (50 nm) and Al …

Unveiling atomic structure and chemical composition of the Al/AlOx/Al Josephson junctions in qubits

X Liu, K Pan, Z Zhang, Z Feng - Applied Surface Science, 2023 - Elsevier
Abstract Qubits incorporating Josephson Junctions are essential for developing quantum
computing devices, nevertheless, nanostructure and chemical information of the junction …

Influence of electrodes on the resistive switching characteristics of Al/Gd2Zr2O7/E (E= Al or ITO) RRAM devices

CW Zhou, CC Wu, TH Hsu, CL Huang - Materials Science in Semiconductor …, 2025 - Elsevier
Sol-gel derived amorphous Gd 2 Zr 2 O 7 (GZO) thin films with Al/GZO/E (E= ITO or Al)
structures were prepared to demonstrate the effect of electrode material on the switching …

Bond Formation at Polycarbonate | X Interfaces (X = Al2O3, TiO2, TiAlO2) Studied by Theory and Experiments

L Patterer, P Ondračka, D Bogdanovski… - Advanced Materials … - Wiley Online Library
Interfacial bond formation during sputter deposition of metal‐oxide thin films onto
polycarbonate (PC) is investigated by ab initio molecular dynamics simulations and X‐ray …