Operando SXRD of E-ALD deposited sulphides ultra-thin films: Crystallite strain and size
Abstract Electrochemical Atomic Layer Deposition (E-ALD), exploiting surface limited
electrodeposition of atomic layers, can easily grow highly ordered ultra-thin films and 2D …
electrodeposition of atomic layers, can easily grow highly ordered ultra-thin films and 2D …
Successes and Issues in the Growth of Moad and MoSe2 on Ag(111) by the E-ALD Method
This paper explores the conditions for the electrodeposition of Moad (molybdenum adlayer)
on Ag (111) from alkaline aqueous solution. Moreover, the first stages of the growth of …
on Ag (111) from alkaline aqueous solution. Moreover, the first stages of the growth of …
Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the Silver Electrode
The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition
of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain …
of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain …
Atomic Layer Deposition (ALD) for Lithium-ion Battery Components
AA Khan - Journal of Humanities and Applied Science …, 2022 - journals.sagescience.org
The demand for high-performance and long-lasting Li-ion batteries has increased
significantly due to the growing use of portable electronic devices, electric vehicles, and …
significantly due to the growing use of portable electronic devices, electric vehicles, and …
CHALLENGES AND OPPORTUNITIES IN ELECTROCHEMICAL ATOMIC LAYER DEPOSITION OF NOBLE METALS
Z Wei, Z Li - Tensorgate Journal of Sustainable Technology …, 2023 - research.tensorgate.org
Abstract Electrochemical Atomic Layer Deposition (E-ALD) is a promising technique for
depositing noble metals with atomic-level precision. However, like any emerging …
depositing noble metals with atomic-level precision. However, like any emerging …
Thermochemistry of the E-ALD process for the growth of CuxZnyS on Ag (111): Interpretation of experimental data
The electrochemical atomic layer deposition (E-ALD) growth of chalcogenides materials
enables the deposition of technologically interesting ultra-thin films. However, this method …
enables the deposition of technologically interesting ultra-thin films. However, this method …
An analysis of potential utilization of low cost Cu2ZnSnS4 thin film based photovoltaic in Sumbawa
A Rukini, L Suhaimi, AS Pradhipta… - IOP Conference Series …, 2019 - iopscience.iop.org
Sumbawa has the potential to transition into a smart city, utilizing solar energy as their main
source of its alternative energy. Located in the tropical country of Indonesia, Sumbawa's dry …
source of its alternative energy. Located in the tropical country of Indonesia, Sumbawa's dry …
Applications of Artificial Intelligence in Electrochemical Atomic Layer Deposition (E-ALD)
Y Mustafa - Applied Research in Artificial Intelligence and Cloud …, 2021 - researchberg.com
Abstract Electrochemical Atomic Layer Deposition (E-ALD) is a promising technique for
synthesizing high-quality thin films and nanostructured materials. In this study, we explored …
synthesizing high-quality thin films and nanostructured materials. In this study, we explored …