Interference lithography is an effective method of patterning periodic structures with limits set
by light diffraction. Using this method at the short wavelengths of extreme ultraviolet (EUV) …

Hot embossing of polymer materials is a promising technology for the fabrication of high
quality and precision patterns on the micro/nano-scales. There are three basic forms of hot …

To improve the surface quality and performance of Ni-SiO 2 nanocomposite coatings, jet
electrodeposition of SiO 2 nanoparticles (diameter 20–30 nm) with Watt's nickel solution was …

We report on the fabrication and characterization of high-resolution gratings with high
efficiency in the extreme ultraviolet (EUV) and soft x-ray ranges using spin-on-carbon (SOC) …

EUV interference lithography records the interference pattern of two diffracted, coherent light
beams, where the pattern resolution is half the diffraction grating resolution. The fabrication …

Extreme ultraviolet interference lithography records the interference pattern of two diffracted,
coherent light beams, where the pattern resolution is half the diffraction grating resolution …

The fabrication of imprinting stamps plays a vital role in the nanoimprinting lithography. In
this work, we proposed a facile method to fabricate TiO 2 hard stamp by patterning sol-gel …

High resolution Fresnel zone plates for nanoscale 3D imaging of materials by both soft and
hard X-ray are growingly needed in broad applications in nanoscience and technology …

Achromatic Talbot lithography (ATL) at extreme ultraviolet (EUV) wavelengths has been
used to produce one or two-dimensional periodic patterns over large areas. In this work, an …

This study investigates the pulsed electrodeposition of Ni/ZrO 2 composite coatings under
different frequency (f) and duty cycle (γ) values. It was found that these pulse conditions …