Wide-bandgap semiconductor materials: For their full bloom

S Fujita - Japanese journal of applied physics, 2015 - iopscience.iop.org
Wide-bandgap semiconductors are expected to be applied to solid-state lighting and power
devices, supporting a future energy-saving society. While GaN-based white LEDs have …

Basic mechanisms of threshold-voltage instability and implications for reliability testing of SiC MOSFETs

AJ Lelis, R Green, DB Habersat… - IEEE Transactions on …, 2014 - ieeexplore.ieee.org
A review of the basic mechanisms affecting the stability of the threshold voltage in response
to a bias-temperature stress is presented in terms of the charging and activation of near …

Threshold-voltage bias-temperature instability in commercially-available SiC MOSFETs

R Green, A Lelis, D Habersat - Japanese Journal of Applied …, 2016 - iopscience.iop.org
This work reports on three important aspects of threshold-voltage instability in SiC power
MOSFETs:(1) the threshold-voltage bias-temperature instability observed in commercial …

[HTML][HTML] Silicon carbide: A unique platform for metal-oxide-semiconductor physics

G Liu, BR Tuttle, S Dhar - Applied Physics Reviews, 2015 - pubs.aip.org
A sustainable energy future requires power electronics that can enable significantly higher
efficiencies in the generation, distribution, and usage of electrical energy. Silicon carbide …

SiC MOSFET threshold-stability issues

AJ Lelis, R Green, DB Habersat - Materials Science in Semiconductor …, 2018 - Elsevier
This work provides additional insight into the threshold-voltage instability effect generally
observed, to varying degrees, in SiC MOSFETs, and discusses the need for an improved test …

Active defects in MOS devices on 4H-SiC: A critical review

HA Moghadam, S Dimitrijev, J Han… - Microelectronics …, 2016 - Elsevier
The state-of-the-art 4H-SiC MOSFETs still suffer from performance (low channel-carrier
mobility and high threshold voltage) and reliability (threshold voltage instability) issues …

[HTML][HTML] N-channel field-effect mobility inversely proportional to the interface state density at the conduction band edges of SiO2/4H-SiC interfaces

H Yoshioka, J Senzaki, A Shimozato, Y Tanaka… - AIP Advances, 2015 - pubs.aip.org
We investigated the effects of the interface state density (D IT) at the interfaces between SiO
2 and the Si-, C-, and a-faces of 4H-SiC in n-channel metal-oxide-semiconductor field-effect …

Bias temperature instability in SiC metal oxide semiconductor devices

C Yang, S Wei, D Wang - Journal of Physics D: Applied Physics, 2021 - iopscience.iop.org
Although silicon carbide (SiC) metal oxide semiconductor field-effect transistors (MOSFETs)
are commercially available, bias temperature instability (BTI) defined as shifts in V th in SiC …

Switching Behaviors and its Dynamics of a Nanodot Under the Assistance of rf Fields

S Okamoto, N Kikuchi, M Furuta, O Kitakami… - Physical review …, 2012 - APS
We have studied the switching behavior of a single Co/Pt multilayer dot under the assistance
of rf fields. The switching field monotonically decreases with increasing rf frequency up to a …

Effects of interface state density on 4H-SiC n-channel field-effect mobility

H Yoshioka, J Senzaki, A Shimozato, Y Tanaka… - Applied Physics …, 2014 - pubs.aip.org
We investigated the effects of D IT at the interface between SiO 2 and Si-, C-, and a-face 4H-
SiC in n-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) that were …