A system for an extreme ultraviolet (EUV) light source includes a radical transport system
that includes one or more conduits, each of the one or more conduits comprising a sidewall …

An optical assembly, in particular for a lithography system for imaging lithographic micro-or
nanostructures, includes at least two optical elements arranged successively in a beam path …

(57) ABSTRACT A fluid is directed toward a surface of an optical element based on a first
flow pattern, the surface of the optical element including debris and the fluid directed based …

The present invention provides a local clean microenviron ment near optical surfaces of an
extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and …

An optical arrangement, in particular a plasma light Source (1') or an EUV lithography
apparatus, with a housing (2), which encloses an interior housing space (3), a vacuum gen …

In order to clean optical components (35) inside an EUV lithography device in a gentle
manner, a cleaning module for an EUV lithography device includes a supply line for molecu …

(57) ABSTRACT A fluid is directed toward a surface of an optical element based on a first
flow pattern, the surface of the optical element including debris and the fluid directed based …

Free radicals that combine with debris that is created by converting a target mixture to
plasma that emits EUV light are received at a first opening defined by a first end of a conduit …

An optical assembly includes an optical element (13), con figured in particular for the
reflection of EUV radiation (4), and a protective element (30) for protecting a surface (31) of …

BACKGROUND An EUV radiation generating apparatus having a beam guiding device for
guiding a laser beam to a target position is known from US 2011/0140008A1. The beam …