Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

Plasma-based physical vapor deposition (PVD) methods have found widespread use in
various industrial applications. In plasma-based PVD processes, the deposition species are …

We explored the effect of magnetic field strength| B| and geometry (degree of balancing) on
the deposition rate and ionized flux fraction F flux in dc magnetron sputtering (dcMS) and …

The present study aims to demonstrate that operating the HiPIMS discharge in bipolar
regime (BP-HiPIMS) enables an energy-enhanced deposition process of high-quality …

High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest
by offering significant advantages such as high target ionization rate, high plasma density …

In high power impulse magnetron sputtering (HiPIMS) operation, there are basically two
goals: a high ionized flux fraction of the sputtered target material and a high deposition rate …

PVD technologies, including vacuum arc evaporation and DC-magnetron sputtering, have
been utilized in industrial settings since the early 1980s for depositing protective coatings …

Despite the tremendous potential for industrial use of tungsten (W), very few studies have
been reported so far on controlling and tailoring the properties of W thin films obtained by …

In high power impulse magnetron sputtering (HiPIMS) process, the magnetic field and
unbalance degree and pulsing configuration are key factors in controlling metal ionization …

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition
technique, providing a high flux of metal ions to the substrate. However, one of the …