We investigated the chemical beam epitaxy of GaP 1− x N x grown on nominally (001)- oriented Si substrates, as desired for the lattice-matched integration of optoelectronic …
W Walukiewicz, JMO Zide - Journal of Applied Physics, 2020 - pubs.aip.org
Alloying is one of the most powerful methods to broaden the range of application of semiconductors. It has been successfully used to tailor the material properties such as …
The compound GaP 1− x N x is highly attractive to pseudomorphically integrate red-light emitting devices and photovoltaic cells with the standard Si technology because it is lattice …
We investigated the chemical beam epitaxy of GaP1-xNx to correlate the growth parameters with their properties when they are grown on nominally (001)-oriented Si substrates, as …
The absorption coefficient and the energy gap of GaP1-xNx layers has been obtained by spectroscopic ellipsometry for samples grown on Si (001) substrates by chemical beam …
KB Saddik, R Volkov, NI Borgardt, MJ Hernández… - researchgate.net
The quaternary dilute-nitride compounds GaP1-xy AsyNx and Ga1-yInyP1-xNx are some of the very few III-V materials that can be grown lattice-matched to Si with the ideal band gaps …