Dynamic down-selection of measurement markers for optimized robust control of overlay errors in photolithography processes
Control of overlay errors in lithography process in semiconductor manufacturing uses in-
process measurements of overlay errors from markers distributed across a wafer to adapt …
process measurements of overlay errors from markers distributed across a wafer to adapt …
Marker layout for optimizing the overlay alignment in a photolithography process
KB Lee, CO Kim - IEEE Transactions on Semiconductor …, 2019 - ieeexplore.ieee.org
In the photolithography process of wafer fabrication, a mask pattern is transferred to a wafer
in a layer-by-layer fashion, and the pattern alignment of adjacent layers is critical to the …
in a layer-by-layer fashion, and the pattern alignment of adjacent layers is critical to the …
Scanner baseliner monitoring and control in high volume manufacturing
We analyze performance of different customized models on baseliner overlay data and
demonstrate the reduction in overlay residuals by~ 10%. Smart Sampling sets were …
demonstrate the reduction in overlay residuals by~ 10%. Smart Sampling sets were …