Understanding the efficacy of linewidth roughness postprocessing
CA Mack - Journal of Micro/Nanolithography, MEMS, and …, 2015 - spiedigitallibrary.org
Lack of progress in reducing linewidth roughness of lithographic features has led to
investigations of the use of postlithography process smoothing techniques. However, it …
investigations of the use of postlithography process smoothing techniques. However, it …
Pattern Roughness Mitigation of 22 nm Lines and Spaces: The Impact of a H2 Plasma Treatment
P De Schepper, A Vaglio Pret, Z El Otell… - Plasma Processes …, 2015 - Wiley Online Library
As the semiconductor industry pursues Moore's law, the demand to obtain smaller features
continues. Extreme ultraviolet (EUV) lithography remains one of the primary options for sub …
continues. Extreme ultraviolet (EUV) lithography remains one of the primary options for sub …
The Influence of H2 Plasma Treatment on LWR Mitigation: The Importance of EUV Photoresist Composition
P De Schepper, Z El Otell, A Vaglio Pret… - Plasma Processes …, 2015 - Wiley Online Library
To meet the demands for sub‐20 nm feature devices in the semiconductor industry,
minimizing the line width roughness (LWR) is a critical concern for ultra‐large scale …
minimizing the line width roughness (LWR) is a critical concern for ultra‐large scale …