In this study, TaWN films were fabricated through co-sputtering. The effects of W addition on
the structural variation and mechanical properties of these films were investigated. TaWN …

In this study, CrWSiN films were fabricated through direct current magnetron cosputtering,
and the sputtering power applied to the target was selected as the process variable. In …

The CrZrN/CrZrSiN multilayer coatings at a bilayer period range decreasing from 1.35 μm to
0.45 μm were synthesized on a Si (100) wafer and WC-6 wt.% Co substrate using a closed …

CrAlN coatings have earned significant attention for use in cutting tool coating applications
due to their excellent properties such as high hardness and superb oxidation resistance. It is …

TiWSi x N films were deposited using a magnetron co-sputtering system on silicon (111),
316L stainless steel, and M2 high-speed steel substrates. The silicon target current density …

Within the frame of this work, reactive magnetron-sputtered (TiZrHf) N coatings were
deposited on Si substrates. The depositions were carried out from a pure TiZrHf target with …

This research manuscript investigates the structural and thermal stability of CrZrON coatings
synthesized through reactive magnetron sputtering. The coatings were deposited at different …

Silicon (Si) has been the paradigm of the electronic industry, because it has been used in
fabrication of different electronic circuit elements such as diodes, operational amplifiers …