Vapor-deposited zeolitic imidazolate frameworks as gap-filling ultra-low-k dielectrics

M Krishtab, I Stassen, T Stassin, AJ Cruz… - Nature …, 2019 - nature.com
The performance of modern chips is strongly related to the multi-layer interconnect structure
that interfaces the semiconductor layer with the outside world. The resulting demand to …

Ultralow dielectric constant polyarylene ether nitrile foam with excellent mechanical properties

L Wang, X Liu, C Liu, X Zhou, C Liu, M Cheng… - Chemical Engineering …, 2020 - Elsevier
Low dielectric constant dielectrics possess a broad prospect for application in
microelectronic devices. The most efficient method for fabricating low dielectric constant …

Poly (vinylidene fluoride) foams: a promising low-k dielectric and heat-insulating material

B Zhao, C Zhao, C Wang, CB Park - Journal of Materials Chemistry C, 2018 - pubs.rsc.org
In this study, we used a batch-foaming method to prepare closed-cell poly (vinylidene
fluoride)(PVDF) foams with tailored microcellular structures. This is a simple, cost-effective …

Fabrication of a novel partially dissolving polymer microneedle patch for transdermal drug delivery

IC Lee, JS He, MT Tsai, KC Lin - Journal of materials chemistry B, 2015 - pubs.rsc.org
Polymer microneedles (MNs) have gained increasing attention as a minimally invasive
method for efficiently delivering drugs and vaccines in a patient-friendly manner. Herein, an …

Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models

MR Baklanov, V Jousseaume, TV Rakhimova… - Applied Physics …, 2019 - pubs.aip.org
This paper presents an in-depth overview of the application and impact of UV/VUV light in
advanced interconnect technology. UV light application in BEOL historically was mainly …

The Origin of the Odd–Even Effect in the Tunneling Rates across EGaIn Junctions with Self-Assembled Monolayers (SAMs) of n-Alkanethiolates

L Jiang, CSS Sangeeth, CA Nijhuis - Journal of the American …, 2015 - ACS Publications
Odd–even effects in molecular junctions with self-assembled monolayers (SAMs) of n-
alkanethiolates have been rarely observed. It is challenging to pinpoint the origin of odd …

Selective Ru ALD as a catalyst for sub-seven-nanometer bottom-up metal interconnects

I Zyulkov, M Krishtab, S De Gendt… - ACS applied materials & …, 2017 - ACS Publications
Integrating bottom-up area-selective building-blocks in microelectronics has a disruptive
potential because of the unique capability of engineering new structures and architectures …

Facile preparation of recyclable cyclic polyolefin/polystyrene vitrimers with low dielectric loss based on semi-interpenetrating polymer networks for high-frequency …

S Wang, L Wang, B Wang, H Su, W Fan, X Jing - Polymer, 2021 - Elsevier
With the rapid development of the fifth-generation mobile communication, stringent
requirements have been put forward for the dielectric properties of polymer-based copper …

Rational design of fluorinated phthalonitrile/hollow glass microsphere composite with low dielectric constant and excellent heat resistance for microelectronic …

M Wu, W Han, C Zhang, S Zhang, X Zhang, X Chen… - Nanomaterials, 2022 - mdpi.com
High-performance composites with a resin matrix are urgently required for electronic
packaging due to their low dielectric constant, outstanding high temperature resistance …

[HTML][HTML] Propagation of atmospheric pressure plasmas through interconnected pores in dielectric materials

J Kruszelnicki, R Ma, MJ Kushner - Journal of Applied Physics, 2021 - pubs.aip.org
The propagation of atmospheric pressure plasmas (APPs) on and through porous dielectric
materials is being investigated for plasma-catalysis and functionalizing biomedical materials …