When composition and crystallographic structure remain constant, film properties mainly
depend on microstructure and surface morphology. In this case, the proper modeling of a …

We propose a novel reaction scheme for the chemical vapor deposition (CVD) of Al films on
substrates from dimethylethylamine alane (DMEAA), supported by the prediction of the Al …

Surface diffusion stands as a fundamental process influencing the dynamics and
thermodynamics of surface reactions, playing a pivotal role in the behavior of …

A computational methodology is introduced for the development of a Reduced Order Model
(ROM) using data from low-fidelity, in terms of the spatial discretization, Computational Fluid …

Catalytic properties of coatings containing the Al13Fe4 intermetallic phase are tested in the
reaction of semi‐hydrogenation of acetylene. The selectivity to ethylene is found as high as …

The rough, even discontinuous morphology of vapor-deposited copper films inhibits their
attractive electrical properties. In the present study, we investigate the influence of …

We utilize mean field approximation to derive a set of coupled non-linear differential
equations for a surface-reaction growth model, incorporating dissociative adsorption …

Amine-alane (AlH3) adducts have been extensively studied for numerous years due to their
ability to function as excellent precursors for aluminum metals in chemical vapor deposition …

In this dissertation, a purely data-driven, equation-free computational framework is proposed
for dealing efficiently and effectively with Computational Fluid Dynamics (CFD) largescale …

The rough, even discontinuous morphology of vapor-deposited copper films inhibits their
attractive electrical properties. In the present study, we investigate the influence of …