[HTML][HTML] Review of transition-metal diboride thin films
We review the thin film growth, chemistry, and physical properties of Group 4–6 transition-
metal diboride (TMB 2) thin films with AlB 2-type crystal structure (Strukturbericht designation …
metal diboride (TMB 2) thin films with AlB 2-type crystal structure (Strukturbericht designation …
[HTML][HTML] Microstructure and materials properties of understoichiometric TiBx thin films grown by HiPIMS
J Thörnberg, J Palisaitis, N Hellgren… - Surface and Coatings …, 2020 - Elsevier
TiB x thin films with a B content of 1.43≤ x≤ 2.70 were synthesized using high-power
impulse magnetron sputtering (HiPIMS) and direct-current magnetron sputtering (DCMS) …
impulse magnetron sputtering (HiPIMS) and direct-current magnetron sputtering (DCMS) …
[HTML][HTML] Where is the unpaired transition metal in substoichiometric diboride line compounds?
The atomic structure and local composition of high quality epitaxial substoichiometric
titanium diboride (TiB 1.9) thin film, deposited by unbalanced magnetron sputtering, were …
titanium diboride (TiB 1.9) thin film, deposited by unbalanced magnetron sputtering, were …
Age hardening in (Ti1− xAlx) B2+ Δ thin films
Abstract Thin films of (Ti 0.71 Al 0.29) B 2+ 1.08 have been deposited by magnetron
sputtering. Post-deposition annealing at 1000° C for 1 h results in increased hardness and …
sputtering. Post-deposition annealing at 1000° C for 1 h results in increased hardness and …
Microstructure-driven strengthening of TiB2 coatings deposited by pulsed magnetron sputtering
Titanium diboride (TiB 2) is a hard coating with a hexagonal crystal structure that maintains
its high hardness and inertness at elevated temperatures, even in contact with aluminum …
its high hardness and inertness at elevated temperatures, even in contact with aluminum …
[HTML][HTML] TiB1. 8 single layers and epitaxial TiB2-based superlattices by magnetron sputtering using a TiB (Ti: B= 1: 1) target
Sputter-deposited titanium diborides are promising candidates for protective coatings in
harsh and extreme conditions. However, growing these layers from TiB 2 diboride targets by …
harsh and extreme conditions. However, growing these layers from TiB 2 diboride targets by …
High-power impulse magnetron sputter deposition of TiBx thin films: Effects of pressure and growth temperature
Titanium boride, TiB x, thin films are grown in pure Ar discharges by high-power impulse
magnetron sputtering (HiPIMS) from a compound TiB 2 target. Film compositions are …
magnetron sputtering (HiPIMS) from a compound TiB 2 target. Film compositions are …
The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputtering
Magnetron sputter deposition of TiB x thin films from a TiB 2 target typically results in highly
overstoichiometric films due to differences in sputtered-atom ejection angles and gas-phase …
overstoichiometric films due to differences in sputtered-atom ejection angles and gas-phase …
Visualization and mechanisms of splashing erosion of electrodes in a DC air arc
The splashing erosion of electrodes in a DC atmospheric-pressure air arc has been
investigated by visualization of the electrode surface and the sputtered droplets, and …
investigated by visualization of the electrode surface and the sputtered droplets, and …
Effect of synchronized bias in the deposition of TiB2 thin films using high power impulse magnetron sputtering
N Nedfors, O Vozniy, J Rosen - … of Vacuum Science & Technology A, 2018 - pubs.aip.org
Titanium diboride thin films have been deposited from a compound TiB 2 target on Si (001)
substrates at a temperature of 500 C using high power impulse magnetron sputtering …
substrates at a temperature of 500 C using high power impulse magnetron sputtering …