III-nitride semiconductor lasers grown on Si

M Feng, J Liu, Q Sun, H Yang - Progress in Quantum Electronics, 2021 - Elsevier
III-nitride semiconductor laser directly grown on Si is a potential on-chip light source for Si
photonics. Moreover, it may greatly lower the manufacture cost of laser diodes and further …

The 2020 UV emitter roadmap

H Amano, R Collazo, C De Santi… - Journal of Physics D …, 2020 - iopscience.iop.org
Solid state UV emitters have many advantages over conventional UV sources. The (Al, In,
Ga) N material system is best suited to produce LEDs and laser diodes from 400 nm down to …

Dopants and defects in ultra-wide bandgap semiconductors

JL Lyons, D Wickramaratne, A Janotti - Current Opinion in Solid State and …, 2024 - Elsevier
Ultra-wide bandgap semiconductors, with bandgaps greater than 3.5 eV, have immense
potential in power-switching electronic applications and ultraviolet light emitters. But the …

[HTML][HTML] On compensation in Si-doped AlN

JS Harris, JN Baker, BE Gaddy, I Bryan, Z Bryan… - Applied Physics …, 2018 - pubs.aip.org
Controllable n-type doping over wide ranges of carrier concentrations in AlN, or Al-rich
AlGaN, is critical to realizing next-generation applications in high-power electronics and …

[HTML][HTML] Toward the predictive discovery of ambipolarly dopable ultra-wide-band-gap semiconductors: The case of rutile GeO2

S Chae, K Mengle, K Bushick, J Lee, N Sanders… - Applied Physics …, 2021 - pubs.aip.org
Ultrawide-band-gap (UWBG) semiconductors are promising for fast, compact, and energy-
efficient power-electronics devices. Their wider band gaps result in higher breakdown …

[HTML][HTML] Correlation between mobility collapse and carbon impurities in Si-doped GaN grown by low pressure metalorganic chemical vapor deposition

F Kaess, S Mita, J Xie, P Reddy, A Klump… - Journal of Applied …, 2016 - pubs.aip.org
In the low doping range below 1× 10 17 cm− 3, carbon was identified as the main defect
attributing to the sudden reduction of the electron mobility, the electron mobility collapse, in n …

[HTML][HTML] Point defect reduction in MOCVD (Al) GaN by chemical potential control and a comprehensive model of C incorporation in GaN

P Reddy, S Washiyama, F Kaess, R Kirste… - Journal of Applied …, 2017 - pubs.aip.org
A theoretical framework that provides a quantitative relationship between point defect
formation energies and growth process parameters is presented. It enables systematic point …

III-nitride nanostructures for high efficiency micro-LEDs and ultraviolet optoelectronics

A Pandey, Z Mi - IEEE Journal of Quantum Electronics, 2022 - ieeexplore.ieee.org
Microscale visible light emitting diodes (LEDs), as well as LEDs and laser diodes operating
in the mid and deep ultraviolet (UV), have emerged as the frontier of semiconductor …

[HTML][HTML] High n-type conductivity and carrier concentration in Si-implanted homoepitaxial AlN

MH Breckenridge, P Bagheri, Q Guo, B Sarkar… - Applied Physics …, 2021 - pubs.aip.org
We demonstrate Si-implanted AlN with high conductivity (> 1 Ω− 1 cm− 1) and high carrier
concentration (5× 10 18 cm− 3). This was enabled by Si implantation into AlN with a low …

[HTML][HTML] Point defect reduction in wide bandgap semiconductors by defect quasi Fermi level control

P Reddy, MP Hoffmann, F Kaess, Z Bryan… - Journal of Applied …, 2016 - pubs.aip.org
A theoretical framework for a general approach to reduce point defect density in materials
via control of defect quasi Fermi level (dQFL) is presented. The control of dQFL is achieved …