Atmospheric pressure non-equilibrium plasma jet technology: general features, specificities and applications in surface processing of materials

F Fanelli, F Fracassi - Surface and Coatings Technology, 2017 - Elsevier
Atmospheric pressure non-equilibrium (cold) plasma jet technology received enormous
attention in surface processing of materials in the last two decades, and still continues …

Uniform deposition of silicon oxide film on cylindrical substrate by radially arranged plasma jet array

R Wang, Z Xia, X Kong, S Xue, H Wang - Surface and Coatings Technology, 2022 - Elsevier
In this work, the SiO x film was deposited on a cylindrical substrate by a radially arranged
plasma jet array generated by an AC power supply. The properties of deposited SiO x film …

Microbolometer with a salicided polysilicon thermistor in CMOS technology

Y Guo, M Luo, H Ma, H Zhu, L Yu, F Yan, P Han… - Optics Express, 2021 - opg.optica.org
The metal-type microbolometers in CMOS technology normally suffer low resistivity and high
thermal conductivity, limiting their performance and application areas. In this paper, we …

Deposition of thin films on glass fiber fabrics by atmospheric pressure plasma jet

M Gao, Y Wang, Y Zhang, Y Li, Y Tang… - Surface and Coatings …, 2020 - Elsevier
Atmospheric pressure plasma jet is conducted to modify commercial glass fiber fabrics using
methyltrimethoxysilane (MTMS) as precursor. An alternating current (AC) high voltage …

[HTML][HTML] Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure

J Schäfer, K Fricke, F Mika, Z Pokorná, L Zajíčková… - Thin Solid Films, 2017 - Elsevier
The present study introduces a process for the synthesis of functional films onto substrates
directly from the liquid phase. The reported method is based on the initialization of the …

Atmospheric pressure microwave plasma jet for organic thin film deposition

M Narimisa, F Krčma, Y Onyshchenko, Z Kozáková… - Polymers, 2020 - mdpi.com
In this work, the potential of a microwave (MW)-induced atmospheric pressure plasma jet
(APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is …

The effect of the process parameters on the growth rate and composition of the anti scratch films deposited from TEOS by AP-PECVD on polycarbonate

AS Bil, SE Alexandrov - Plasma Chemistry and Plasma Processing, 2023 - Springer
In this paper we report on a study of the composition and growth rate of anti scratch silica-
like coatings deposited on polycarbonate (PC) in an atmospheric pressure dielectric barrier …

Impact of various thermistors on the properties of resistive microbolometers fabricated by CMOS process

Y Guo, H Ma, J Lan, Y Liao, X Ji - Micromachines, 2022 - mdpi.com
Microbolometers based on the CMOS process has the important advantage of being
automatically merged with circuits in the fabrication of larger arrays, but they typically suffer …

Performance-enhanced polysilicon microbolometer in CMOS technology with a grating structure

Y Guo, H Ma, K Wang, L Zhang, F Yan… - IEEE Photonics …, 2023 - ieeexplore.ieee.org
The resistive microbolometer fabricated by using CMOS technology can be monolithically
integrated with the readout circuit but usually performs poorly in responsivity and detectivity …

Thin SiNC/SiOC coatings with a gradient of refractive index deposited from organosilicon precursor

H Szymanowski, K Olesko, J Kowalski, M Fijalkowski… - Coatings, 2020 - mdpi.com
In this work, optical coatings with a gradient of the refractive index are described. Its aim was
to deposit, using the RF PECVD method, films of variable composition (ranging from silicon …